Facial mask material without adding facial mask essence and preparation method thereof

A technology that does not require additives and essences. It is applied to skin care preparations, medical preparations containing active ingredients, and pharmaceutical formulas. It can solve problems such as poor biocompatibility, poor fit, and poor water holding performance. Achieve good water holding capacity, improve safety and mechanical strength, and excellent veneer effect

Active Publication Date: 2016-02-03
嘉文丽(福建)化妆品有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to solve the problems of poor adhesion, poor water holding capacity, poor biocompatibility, and no sustained release of the mask materials currently on the market, and to develop a moisturizing mask that does not need to add additional mask essence. , whitening, anti-aging and other facial mask products

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] A mask material that does not need to add mask essence and its manufacturing process is composed of the following raw materials in parts by weight, and is operated according to the following steps:

[0021] a, dissolving, 15 parts by weight of Hydrangea extract, 10 parts of yeast extract, 5 parts of lecithin, 0.1 part of fullerene, 3 parts of PVP, 2 parts of PVA, 0.2 part of glycerol, 0.3 part of pentylene glycol, 0.1 part of octanediol, 0.2 part of citric acid and 200 parts of deionized water are mixed and dissolved in proportion, and the pH value is adjusted to 7.5 to obtain a slurry;

[0022] b. Electrolysis, pour the slurry into the electrolytic tank, and electrolyze for 1.5h;

[0023] c. Ultraviolet irradiation, pour the electrolyzed slurry into a tray or mold, and irradiate it under an ultraviolet lamp for 10 minutes;

[0024] d, heat preservation and drying, after being treated in step c, dry at 60°C until the water content is 8%;

[0025] e, cutting the film, ...

Embodiment 2

[0028] A mask material that does not need to add mask essence and its manufacturing process is composed of the following raw materials in parts by weight, and is operated according to the following steps:

[0029] a, dissolving, 20 parts by weight of Hydrangea extract, 5 parts of yeast extract, 1 part of lecithin, 0.05 part of fullerene, 1 part of PVP, 3 parts of PVA, 0.5 part of glycerol, 0.1 part of pentylene glycol, 0.2 parts of octanediol, 0.05 parts of citric acid and 250 parts of deionized water were mixed and dissolved in proportion, and the pH value was adjusted to 7.0 to obtain a slurry;

[0030] b. Electrolysis, pour the slurry into the electrolytic tank, and electrolyze for 2 hours;

[0031] c. Ultraviolet irradiation, pour the electrolyzed slurry into a tray or mold, and irradiate it under an ultraviolet lamp for 5 minutes;

[0032] d, heat preservation and drying, after being treated in step c, dry at 60°C until the water content is 10%;

[0033] e, cutting the ...

Embodiment 3

[0036] A mask material that does not need to add mask essence and its manufacturing process is composed of the following raw materials in parts by weight, and is operated according to the following steps:

[0037] a, dissolving, 10 parts by weight of Hydrangea extract, 8 parts of yeast extract, 2 parts of lecithin, 0.5 part of fullerene, 2 parts of PVP, 2 parts of PVA, 1 part of glycerol, 0.2 part of pentylene glycol, 0.05 parts of octanediol, 0.5 parts of citric acid and 100 parts of deionized water are mixed and dissolved in proportion, and the pH value is adjusted to 5.9 to obtain a slurry;

[0038] b. Electrolysis, pour the slurry into the electrolytic tank, and electrolyze for 0.5h;

[0039] c. Ultraviolet irradiation, pour the electrolyzed slurry into a tray or mold, and irradiate it under an ultraviolet lamp for 8 minutes;

[0040] d, heat preservation and drying, after being treated in step c, dry at 60°C until the water content is 5%;

[0041] e, cutting the film, c...

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Abstract

The invention relates to a facial mask material without adding facial mask essence and a preparation method thereof, and aims to solve the technical problem of providing the facial mask material which has good fitting degree, good tissue compatibility and excellent water retention and has a sustained-release function, and can be used for achieving the effects of whitening, moistening, aging-relieving and the like without adding facial mask essence. According to the technical scheme, the preparation method comprises the following steps: weighing sparassis crispa extract, yeast extract, lecithin, fullerene, PVP, PVA, glycerinum, pentylene glycol, octylene glycol, citric acid and deionized water according to a prescribed weight portion; dissolving the components, and regulating the pH value to be 5.0-9.0; and performing electrolysis, ultraviolet radiation, insulating drying and film-slitting to obtain a facial mask with a required shape. The facial mask material can be used after being directly soaked in water, and has the effects of moistening, whitening, relieving senescence and the like.

Description

technical field [0001] The invention relates to the technical field of cosmetics, in particular to a mask material that can be used without adding mask essence and a preparation method thereof. Background technique [0002] Mask is one of the most common and most portable skin care products. It is applied or spread on the surface of human skin, and after a period of time, it is peeled off, scrubbed or retained for intensive care or cleaning. At present, various brands and masks with different functions are constantly being developed, but these masks mostly use different essences, and the materials of the masks have not been updated much, and the effects are average, and there are more Side effects, not suitable for long-term use. [0003] At present, the commonly used facial mask materials are mostly made of paper, cotton linen, polyester and other materials. These materials are widely used because they are cheap and easy to obtain, but they have the following disadvantages...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/99A61K8/97A61K8/19A61K8/55A61K8/02A61Q19/02A61Q19/08A61Q19/00
CPCA61K8/0212A61K8/19A61K8/345A61K8/36A61K8/553A61K8/8129A61K8/817A61K8/99A61K2800/81A61K2800/83A61Q19/00A61Q19/02A61Q19/08
Inventor 饶焕文林建平萧自智潘发伍陈康
Owner 嘉文丽(福建)化妆品有限公司
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