Semiconductor device and forming method thereof
A semiconductor and device technology, applied in the field of semiconductor devices and their formation, can solve the problems of insufficient to meet the needs of improving the operating speed of semiconductor devices, the limited degree of carrier mobility improvement, and the reduction of drain induction barriers, etc., to achieve the suppression of short-term Effect of channel effect, improvement of carrier mobility, and improvement of operating speed
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[0036] It can be seen from the background art that the carrier mobility of the semiconductor device formed in the prior art is limited, and there are problems such as short channel effect and source-drain punchthrough.
[0037] In order to solve the above-mentioned problems, research is conducted on the formation process of semiconductor devices. The formation process of semiconductor devices includes the following steps, please refer to figure 1 : Step S1, providing a semiconductor substrate, the surface of the semiconductor substrate is formed with a gate structure; Step S2, carrying out the first ion implantation to the semiconductor substrate on both sides of the gate structure, forming a lightly doped region (LDD) ; Step S3, performing second ion implantation on the semiconductor substrate on both sides of the lightly doped region close to the channel region to form a pocket region (Pocket); Step S4, forming sidewalls on both sides of the gate structure; The sidewall is ...
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