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Semiconductor device and forming method thereof

A semiconductor and device technology, applied in the field of semiconductor devices and their formation, can solve the problems of insufficient to meet the needs of improving the operating speed of semiconductor devices, the limited degree of carrier mobility improvement, and the reduction of drain induction barriers, etc., to achieve the suppression of short-term Effect of channel effect, improvement of carrier mobility, and improvement of operating speed

Active Publication Date: 2016-03-30
SEMICON MFG INT (SHANGHAI) CORP
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Problems solved by technology

[0005] However, in practical applications, it has been found that the degree of improvement in carrier mobility of semiconductor devices formed by existing technologies is limited, which is not enough to meet the needs of increasing the operating speed of semiconductor devices, and there are problems such as lowering of the drain induction barrier and leakage current.

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  • Semiconductor device and forming method thereof
  • Semiconductor device and forming method thereof
  • Semiconductor device and forming method thereof

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Embodiment Construction

[0036] It can be seen from the background art that the carrier mobility of the semiconductor device formed in the prior art is limited, and there are problems such as short channel effect and source-drain punchthrough.

[0037] In order to solve the above-mentioned problems, research is conducted on the formation process of semiconductor devices. The formation process of semiconductor devices includes the following steps, please refer to figure 1 : Step S1, providing a semiconductor substrate, the surface of the semiconductor substrate is formed with a gate structure; Step S2, carrying out the first ion implantation to the semiconductor substrate on both sides of the gate structure, forming a lightly doped region (LDD) ; Step S3, performing second ion implantation on the semiconductor substrate on both sides of the lightly doped region close to the channel region to form a pocket region (Pocket); Step S4, forming sidewalls on both sides of the gate structure; The sidewall is ...

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Abstract

Provided are a semiconductor device and a forming method thereof. The forming method of the semiconductor device comprises steps of: providing a substrate on the surface of which a pseudo gate structure is formed; forming doped regions in the substrate on both sides of the pseudo gate structure; forming an interlayer dielectric layer covering the surfaces of the doped regions and the surface of the pseudo gate structure, wherein the top surface of the interlayer dielectric layer is aligned with that of the pseudo gate structure; etching and removing the pseudo gate structure and the substrate with a certain thickness under the pseudo gate structure, and forming a channel in the substrate; filling the channel with a channel stress layer the material of which is insulated material and the top surface of which is lower than the surface of the substrate; forming an intrinsic layer on the surface of the channel stress layer and fully filling the channel with the intrinsic layer; and forming a gate structure on the surface of the intrinsic layer. While increasing the carrier mobility of the semiconductor device, the semiconductor device forming method inhibits a short-channel effect and a source-drain punchthrough problem and optimizes the electric performance and the reliability of the semiconductor device.

Description

technical field [0001] The invention relates to the technology in the field of semiconductor manufacturing, in particular to a semiconductor device and a forming method thereof. Background technique [0002] With the continuous development of semiconductor technology, carrier mobility enhancement technology has been widely studied and applied. Improving the carrier mobility in the channel region can increase the driving current of semiconductor devices and improve the performance of devices. [0003] In the existing manufacturing process of semiconductor devices, since stress can change the energy gap and carrier mobility of silicon materials, it has become more and more common means to improve the performance of semiconductor devices through stress. Specifically, by properly controlling the stress, the mobility of carriers (electrons in NMOS devices, holes in PMOS devices) can be increased, thereby increasing the driving current, thereby greatly improving the performance of...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/336H01L21/28H01L29/78H01L29/10
Inventor 赵猛
Owner SEMICON MFG INT (SHANGHAI) CORP
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