A Microstructure Forming Method Based on Microprism Array

Abstract

A microprism array based micro-structure formation method is disclosed. The formation method comprises the steps of (1) coating the surface of a base with photoresist; (2) putting the photoresist surface of the base below the microprism array; (3) taking a collimated laser source as an exposure light source for irradiating the microprism array; (4) moving the microprism array or moving a substrate coated with the photoresist in the exposing process, and performing continuous modulation on light intensity on the surface of a resist; and (5) taking out the substrate, and developing the substrate to obtain the required partially-intervened photoresist micro-structure. According to the microprism array based micro-structure formation method, large-scale equipment is not required for photoetching masks, so that the complexity of the process is greatly reduced.

Description

technical field [0001] The invention belongs to the technical field of micro-nano structure processing, in particular to a micro-structure forming method based on a micro-prism array. Background technique [0002] In recent years, with the rapid development of micro-nano processing technology and nanomaterials, the electromagnetic properties of micro-nano metal structures are receiving more and more attention. The interaction of light with surface micro-nano metal structures produces a series of new and exotic physical phenomena. For example, in 1998, French scientist Ebbesen and his collaborators discovered the phenomenon of extraordinary enhancement (Extraordinary Optical Transmission) of light passing through a subwavelength metal hole array. The research of H. J. Lezec et al. further showed that: when the light passes through the sub-wavelength metal nanohole, its transmittance can not only be enhanced, but also the diffraction angle of the beam is very small, and the t...

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is to provide a method for forming a microstructure based on a microprism array, aiming at the problems of existing nanoscale microstructure formation requiring large-scale equipment, complex processes, and difficulties in making small-scale graphics. The method does not need to use large-scale equipment to prepare photolithographic masks, and can realize the preparation of nano-gratings only through microprisms, and also greatly simplifies the preparation process of nanostructures

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