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Process for improving negative photoresist storage stability of cyclized isoprene system

A technology for cyclization of isoprene and storage stability, applied in the direction of photosensitive materials for optomechanical equipment, etc., can solve the problem of loss of protection of photoresist, and achieve low production cost, mild operating conditions, and simple process. Effect

Inactive Publication Date: 2016-04-06
SUZHOU RUIHONG ELECTRONIC CHEM CO LTD
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Problems solved by technology

The increase of small particles will have a joint effect on the precipitation of the photosensitizer in the negative film. As time goes on, there will be more and more small particles, and gradually transform into large particles. After the negative film is coated, particles will be produced. After the etching process, pinholes and undercutting will occur, so that the photoresist loses its protective effect

Method used

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  • Process for improving negative photoresist storage stability of cyclized isoprene system
  • Process for improving negative photoresist storage stability of cyclized isoprene system

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Embodiment Construction

[0018] 1. First, add polyisoprene into xylene, fully dissolve, add catalyst butyllithium, raise the temperature to 50°C, keep it for 2 hours, check the molecular weight with gel chromatography, and add a terminator when it reaches the specified value. Transfer to the cyclization kettle, raise the temperature to 90°C, add p-toluenesulfonic acid, and continuously monitor the cyclization degree of the cyclized isoprene during the reaction process. After reaching the specified value, add pure water to stop. After several times of washing with pure water, the PH reaches neutral, add hydrogen peroxide, keep the temperature at 65°C, control the oxidation time, divide the water, wash with pure water three times, clean out the hydrogen peroxide, filter with a 0.2um frame filter, after repeated Concentrate to reach the specified solid content, transfer to 100-level purification workshop for photoresist configuration, add photosensitizer, additives and other raw materials, stir and filter...

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Abstract

The present invention provides a process for improving negative photoresist storage stability of a cyclized isoprene system. The storage stability of a product is maintained by oxidizing an uncyclized double bond in isoprene in advance. The service life of a negative photoresist product using cyclized isoprene as a parent is effectively improved, and the problem that aging and deterioration of rubber cannot be detected by testing a molecular weight and a cyclized rate in traditional detection methods can be solved by monitoring the condition of particles. The process successfully extends the storage life of the negative photoresist from one year to two years, so that the negative photoresist product is greatly broken through, the production ability of a manufacturer and the use and storage of a client are improved, and the negative photoresist has a high market prospect.

Description

Technical field [0001] The invention relates to a process for improving the storage stability of negative glue in a cyclized isoprene system. The process can To effectively extend the storage time of negative glue. Background technique [0002] In order to transfer patterns during the photolithography process, photoresist must be used. By changing the properties of the photoresist material, the photoresist pattern is copied on the surface of the wafer after the photolithography process is completed. Photolithography technology is a key technology for the development of microelectronics technology, and cyclized rubber is a key material for photoresist. As a key matrix material for negative photoresist, cyclized isoprene has special adhesion properties that can withstand etching by different proportions of hydrofluoric acid and nitric acid systems, so it can be widely used in microelectronic integrated circuits and semiconductor manufacturing. In process. Photoresist must...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/016
CPCG03F7/016
Inventor 卞玉桂马骥
Owner SUZHOU RUIHONG ELECTRONIC CHEM CO LTD
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