Infrared and ultraviolet cutoff filtering film structure for large curvature lens surface and manufacture method thereof

A large-curvature lens and cut-off filter technology, applied in optics, optical components, instruments, etc., can solve problems such as poor compactness of the film layer, difficulty in ensuring the consistency of the thickness of the film layer and the central film layer, and weak firmness of the edge film layer

Active Publication Date: 2016-05-18
舜宇光学(中山)有限公司
View PDF9 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, depositing an optical thin film on the surface of a large-curvature lens is difficult to overcome for a coating machine with a central rotary method. It is difficult to ensure that the thickness of the film layer on the edge of the large-curvature lens sheet is consistent with the thickness of the central film layer, and the edge film layer The firmness is very weak

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Infrared and ultraviolet cutoff filtering film structure for large curvature lens surface and manufacture method thereof
  • Infrared and ultraviolet cutoff filtering film structure for large curvature lens surface and manufacture method thereof
  • Infrared and ultraviolet cutoff filtering film structure for large curvature lens surface and manufacture method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0030] see Figure 1-Figure 3 The infrared and ultraviolet cut-off filter film structure used on the surface of the large-curvature lens includes a large-curvature lens, and the infrared-ultraviolet cut-off filter film is arranged on the large-curvature lens. Low-refractive-index film layers and high-refractive-index film layers on the lens; the number of low-refractive-index film layers is ≥10, and the number of high-refractive-index film layers is ≥10.

[0031] In this embodiment, the infrared and ultraviolet cut-off filter film has a multi-layer structure of 45 layers.

[0032] The material of the low refractive index film layer adopts SiO 2 , the material of the high refractive index film layer is Ti 3 o 5 or Ta 2 o 5 .

[0033] A method for manufacturing an infrared-ultraviolet cut-off filter film structure used on the surface of a large-cur...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides an infrared and ultraviolet cutoff filtering film structure for a large curvature lens surface and a manufacture method thereof. The infrared and ultraviolet cutoff filtering film structure for the large curvature lens surface comprises a large curvature lens which is provided with an infrared and ultraviolet cutoff filtering film. The infrared and ultraviolet cutoff filtering film comprises low refractive index film layers and high refractive index film layers which are alternately stacked on the large curvature lens, the number of the low refractive index film layers is larger than or equal to 10, and number of the high refractive index film layers is larger than or equal to 10. The infrared and ultraviolet cutoff filtering film is a 45-layer multi-film-layer structure. The low refractive index film layers are made of SiO2, and the high refractive index film layers are made of Ti3O5 or Ta2O5. The infrared and ultraviolet cutoff filtering film structure has the advantages of a simple and reasonable structure, consistent film layer uniformity, and strong film firmness.

Description

technical field [0001] The invention relates to the field of optical thin film design and process manufacturing, in particular to an infrared and ultraviolet cut-off filter film structure and a manufacturing method for the surface of a large curvature lens. Background technique [0002] Infrared light suppression is one of the necessary functions of the image sensor, because CCD and CMOS are different from the human eye in terms of light sensitivity. Human eyes can only see visible light of 380-780nm, while CCD and CMOS can sense infrared light and ultraviolet light, especially sensitive to infrared light. Therefore, it is necessary to suppress infrared light and ultraviolet light, and maintain a high transmittance of visible light, so that the light sensitivity of CCD and / or COMS is close to that of human eyes, so that the captured images also conform to the sensitivity of human eyes. [0003] Generally speaking, infrared and ultraviolet cut-off filters can be added to the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B5/28
CPCG02B5/282
Inventor 冯君刚谢志高李毅帧聂小飞叶忠海
Owner 舜宇光学(中山)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap