Vector arc stage switching method and device for double rotary balance mass-based dynamic magnetic steel type magnetic levitation workpiece stages

Abstract

The invention provides a vector arc stage switching method and device for double rotary balance mass-based dynamic magnetic steel type magnetic levitation workpiece stages, and belongs to a semiconductor manufacturing equipment technology. The device comprises a support frame, a balance mass block, a rotating shaft, magnetic levitation workpiece stages, a workpiece stage measurement device and a workpiece stage drive device, wherein the two workpiece stages work between a measurement station and an exposure station; the positions of the workpiece stages are measured by plane gratings; the workpiece stages are driven by magnetic levitation planar motors; and the two workpiece stages are driven by the planar motors to achieve single-beat arc fast stage switching in the double workpiece stage switching process. According to the vector arc stage switching method and device, the problems that an existing stage switching scheme has multiple beats, a long track, multiple starting and stopping beats, long stabilization time and the like are solved; the stage switching link is reduced; the stage switching time is shortened; and the productivity of a lithography machine is improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and a device for a moving magnet steel maglev double workpiece table vector arc return transfer table based on a rotary balance mass. Background technique [0002] Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. As the key subsystem of the lithography machine, the workpiece table largely determines the resolution, overlay accuracy and productivity of the lithography machine. [0003] Productivity is one of the main goals of lithography machine development. Under the condition of satisfying the resolution and overlay accuracy, improving the operating efficiency of the workpiece table and thus improving the productivity of the lithography machine is the development direction of the workpiece table technology. The most direct way to improve the operating ef...

AI Technical Summary

Problems solved by technology

However, the transposition of the workpiece table by rotating the entire base has problems such as large moment of inertia, difficulty in precise positioning of high-power rotary motors, and high heat generation that cause system temperature rise. At the same time, the radius of gyration is large, which significantly increases the structure of the main body of the lithography machine.

Chinese patent CN102495528 adopts a rotary transfer table in the center of the abutment to complete the exchange of double workpiece tables. The table change is divided into three beats, which improves the efficiency of the table change. However, the structure of the rotary transfer table is complicated and the rotary positioning accuracy is low.

The workpiece table moves at a high speed, and the measurement scheme must meet the high-speed measurement and precision requirements. In US patents US6498350B2 and US20100279232A1, multiple laser interferometers are used to measure the position of a workpiece table. The laser interferometer has high measurement accuracy, The working distance is long, but the measurement optical path is too long, it is very sensitive to errors caused by humidity and air turbulence, and the cost is high

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