Gallium arsenide-based low-brightness yellow light-emitting diode chip and manufacturing method thereof
A light-emitting diode and low-brightness technology, which is applied to electrical components, circuits, semiconductor devices, etc., can solve the problem of chip products’ ability to resist electrostatic breakdown and other problems
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[0029] 1. Epitaxial wafer and chip production process steps:
[0030] 1. Place the n-type GaAs substrate in the reaction chamber of the MOCVD system, heat it to 600°C-700°C, remove the passivation layer on the surface of the substrate, and grow on one side of the n-type GaAs substrate to form a certain thickness n-type GaAs buffer layer doped with silicon.
[0031] 2. Using Al on the GaAs buffer layer x Ga 1-x As is the material for deposition, where, 0.1≤X≤1, the thickness d of the deposited n-type anti-reflection layer conforms to the following relationship: n(λ)d=N·λ / 2; where λ is the electroluminescence of the epitaxial wafer The central wavelength, n(λ) is the refractive index of the material of this layer to the light with wavelength λ, N is a positive integer, and 1≤N≤10.
[0032] 3. Depositing an n-type carrier confinement layer on the anti-reflection layer.
[0033] 4. Depositing and forming a double heterojunction active region layer on the n-type carrier confine...
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