Mask take-out device and clamping mechanism thereof

Abstract

The invention relates to a mask take-out device and a clamping mechanism thereof. The mask take-out device at least includes a box opening mechanism and the clamping mechanism arranged on the box opening mechanism. The clamping mechanism is arranged on one side of a movable plate on a substrate, and is provided with a bed plate capable of moving up and down relative to the substrate, wherein the bottom of the bed plate is provided with an actuator used for driving a hinged cantilever hinged to the top surface of the bed plate to rotate; the free end of the hinged cantilever is provided with a holder; the holder is provided with two holding heads getting near or far away synchronously to synchronously clamp or release two opposite edges of a mask. Accordingly, the mask take-out device can not only utilize the box opening mechanism to selectively and automatically open or close a mask conveying box, but also clamp the mask through the holder of the clamping mechanism; in addition, the through the holding heads of the holder, the mask take-out device can sharply reduce the clamping width and area of mask edges, thereby avoiding touching a pellicle, not influencing alignment marks and bar codes, stably clamping the mask and improving work efficiency.

Description

technical field [0001] The invention relates to a retrieving technology for taking out and moving a photomask, in particular to a photomask retrieving device and its clamping mechanism that can automatically clip a photomask, so as to improve the convenience of clipping and improve the movement stability at work. Background technique [0002] In the semiconductor manufacturing process, the production of the wafer surface pattern is completed by photolithography and etching process, among which the mask is an indispensable key. The photomask is a translucent glass sheet with a specific pattern, which contains a pattern area with a pattern, which is used to transfer the pattern on the pattern area to the photoresist on the wafer by using a light source, and then undergo an etching process Complete the pattern on the wafer surface. In order to protect the graphics on the pattern area, the photomask usually has a Pellicle above the pattern area to prevent the graphics on the p...

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Problems solved by technology

[0007] In view of this, the present inventor has made an in-depth discussion on the problems faced during the above-mentioned existing photomask clamping, and actively seeks a solution by virtue of the inventor's many years of experience in related development, through continuous efforts in research and development , and finally successfully developed a utility model for a photomask retrieving device and its clamping mechanism to overcome the troubles and inconveniences caused by the large clamping area and long moving distance of the existing ones

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