Double split trench gate charge storage-type RC-IGBT and manufacturing method thereof

A charge storage and charge storage layer technology, applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve the problem of reducing the switching speed of the device, poor reverse recovery characteristics of the freewheeling diode, and affecting the turn-on voltage drop switch of the device. Loss trade-off characteristics, etc.

Active Publication Date: 2016-07-06
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, for the traditional RC-CSTBT device structure, in the forward IGBT mode, due to the presence of a higher doping concentration and a certain thickness of the N-type charge storage layer, the breakdown voltage of the device is significantly reduced. In order to effectively shield the N-type Adverse effects of the charge storage layer To obtain a certain device withstand voltage, it is necessary to adopt: 1) deep trench gate depth, so that the depth of the trench gate is greater than the junction depth of the N-type charge storage layer, but the deep trench gate depth not only increases The larger gate-emitter capacitance also increases the gate-collector capacitance, thus reducing the switching speed of the device, increasing the switching loss of the device, and affecting the compromise between the conduction voltage drop and switching loss of the device characteristics; 2) The small cell width minimizes the distance between the trench gates. However, the high-density trench MOS st...

Method used

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  • Double split trench gate charge storage-type RC-IGBT and manufacturing method thereof
  • Double split trench gate charge storage-type RC-IGBT and manufacturing method thereof
  • Double split trench gate charge storage-type RC-IGBT and manufacturing method thereof

Examples

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Embodiment 1

[0051] In this example, a double-split trench gate charge storage RC-IGBT, its cell structure is as follows figure 2 As shown, it includes: the back collector metal 13, the P-type collector region 11 and the N-type collector region 12 located on the back collector metal 13 and connected to it, and the P-type collector region 11 and the N-type collector region The N-type field stop layer 10 above and connected to the N-type field stop layer 10, the N-drift region 9 located on the N-type field stop layer 10 and connected to it; the compound double split trench located in the middle of the upper part of the N-drift region 9 and connected to it Structure; the N-type charge storage layer 8 located on both sides of the upper part of the N-drift region 9 and connected to it, the side wall of the N-type charge storage layer 8 is connected to the side wall of the composite double-split trench structure, located in the N-type charge storage layer The p-type base region 7 on the upper p...

Embodiment 2

[0053] In this example, a double-split trench gate charge storage RC-IGBT, its cell structure is as follows image 3 As shown, different from Embodiment 1, the lower part of the side split electrode 33 directly extends to the upper surface of the bottom split electrode 31, so that the side split electrode 33 and the bottom split electrode 31 are directly connected to further reduce the gate capacitance of the device.

Embodiment 3

[0055] In this example, a double-split trench gate charge storage RC-IGBT, its cell structure is as follows image 3 As shown, different from Example 1, there is also a layer of N+ layer 14 in the partial region between the underlying structure of the composite trench structure and the p-type base region 7, and the concentration of the N+ layer 14 is higher than that of the N-type The concentration of the charge storage layer 8 and its sidewalls are connected to the composite trench structure, the formed N+ layer 14 further reduces the resistance of the area between the lower layer structure of the composite trench structure and the p-type base region 7, and further improves The carrier injection enhancement effect of the emitter is eliminated, and a better compromise between the forward voltage drop of the device and the switching loss can be obtained.

[0056] The specific implementation scheme of the process manufacturing method of the present invention is described by taki...

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Abstract

The invention belongs to the technical field of power semiconductor devices, and particularly relates to a reverse trench gate charge storage-type insulated gate bipolar transistor. Double split electrodes which are equal to an emitter in potential and dielectric layers between the double split electrodes and a gate electrode are introduced into the bottom part and the side surface of the gate electrode in a trench of an RC-IGBT device, so that the switching speed of the device in the IGBT working mode is improved; the carrier concentration distribution of the whole N-type drift region is improved; the switching loss of the device is reduced; the saturated current density of the device is reduced; the short-circuit safe operation area of the device is improved; the reliability is improved; a reverse free-wheeling diode has a low diode conduction voltage drop in a reverse free-wheeling diode working mode; the reverse recovery characteristics of the free-wheeling diode are improved; and meanwhile, the manufacturing method of the double split trench gate charge storage-type IGBT does not need to increase an extra processing step and is compatible with a traditional RC-IGBT manufacturing method.

Description

technical field [0001] The invention belongs to the technical field of power semiconductor devices, and relates to an insulated gate bipolar transistor (IGBT), in particular to a reverse conduction trench gate charge storage type insulated gate bipolar transistor (RC-CSTBT). Background technique [0002] Insulated Gate Bipolar Transistor (IGBT) is a new type of power electronic device combining MOS field effect and bipolar transistor. It not only has the advantages of easy driving and simple control of MOSFET, but also has the advantages of low conduction voltage of power transistor, large on-state current and small loss. It has become one of the core electronic components in modern power electronic circuits and is widely used in Various fields of the national economy such as communications, energy, transportation, industry, medicine, household appliances and aerospace. The application of IGBT plays an extremely important role in improving the performance of power electroni...

Claims

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Application Information

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IPC IPC(8): H01L29/739H01L21/331
CPCH01L29/6634H01L29/7396H01L29/7398
Inventor 张金平廖航刘玮琪刘竞秀李泽宏任敏张波
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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