Semiconductor device and manufacturing method therefor, array substrate and display device
A manufacturing method and semiconductor technology, applied in the direction of semiconductor/solid-state device manufacturing, semiconductor devices, transistors, etc., to achieve the effect of improving performance, increasing length, and long channel
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Embodiment 1
[0027] combine figure 1 with figure 2 As shown, a thin film transistor is provided in this embodiment, which includes a semiconductor layer 1 disposed on a substrate 100 , a gate electrode 3 , a source electrode 4 and a drain electrode 5 . When the thin film transistor is in the open state, the semiconductor layer 1 between the source electrode 4 and the drain electrode 5 forms a conductive channel. The extension length from one side of the electrode 4 to the side close to the drain electrode 5 .
[0028] Wherein, the semiconductor layer 1 includes a first part and a second part, the plane where the first part is located intersects the plane where the substrate 100 is located, and the plane where the second part is located is parallel to the plane where the substrate 100 is located, so that the semiconductor layer 1 is parallel to the plane of the substrate 100 Both the direction and the direction perpendicular to the substrate 100 are distributed, so that under a certain p...
Embodiment 2
[0065] Based on the same inventive concept, combining image 3 and Figure 4 As shown, a semiconductor device is provided in this embodiment, including a semiconductor layer 1 disposed on a substrate 100, a first electrode 40, a first electrode 50 and two gate electrodes 3, the gate electrode 3 is connected to the first electrode 40, the second An insulating layer is disposed between the two electrodes 50 and the semiconductor layer 1 , one end of the semiconductor layer 1 is in electrical contact with the first electrode 40 , and the opposite end is in electrical contact with the second electrode 50 . By arranging two gate electrodes 3, the semiconductor device can realize the function of the thin film transistor, and at the same time, the threshold voltage can be adjusted, and the performance of the semiconductor device can be improved.
[0066] Wherein, the semiconductor layer 1 includes a first part and a second part, the plane where the first part is located intersects t...
Embodiment 3
[0133] In the array substrate and display device in the embodiment of the present invention, the array substrate adopts the thin film transistor in embodiment 1 or the semiconductor device in embodiment 2, and the display device adopts the above-mentioned array substrate. Next, the length of the semiconductor layer of the thin film transistor is increased, which can provide a longer conductive channel and improve the performance of the thin film transistor. Moreover, thin film transistors with smaller sizes can be realized, and the performance of thin film transistors can be guaranteed, which is suitable for high-resolution products.
[0134] The display device may be a liquid crystal display device, an organic light emitting diode display device, or other display devices including thin film transistors.
[0135] The display device may be any product or component with a display function such as a display substrate, a display panel, an electronic paper, a mobile phone, a tablet...
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