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System and method for recycling chlorosilane tail gas

A technology for recycling and processing chlorosilanes, which is applied in the direction of halosilanes, chemical instruments and methods, silicon compounds, etc., can solve the problems of difficult environmental protection standards, large material loss, and high pressure on three wastes treatment, so as to reduce material loss and alleviate Dealing with pressure and solving the effect of excessive material loss

Active Publication Date: 2016-09-21
YICHANG CSG POLYSILICON CO LTD
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Problems solved by technology

[0004] The purpose of the present invention is to provide a system and method for recovering and treating chlorosilane tail gas, which can well solve the problems of excessive material loss in the polysilicon production process, high pressure on three wastes treatment, and difficulty in meeting environmental protection standards

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  • System and method for recycling chlorosilane tail gas

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Embodiment Construction

[0023] The present invention will be further described below in conjunction with the examples, but the protection scope of the present invention is not limited to the scope expressed in the examples.

[0024] A system for recovering and treating chlorosilane tail gas, comprising a tail gas collection system 1, a reaction system 2 and a condensation system 3 connected in sequence; wherein the reaction system 2 includes a reaction tower 21, and the upper and lower parts of the reaction tower 21 are equipped with packing layers 22, A catalyst layer 23 is provided in the middle, and a reboiler 24 and a liquid-phase silicon tetrachloride replenishment pipe 25 are also connected at the bottom.

[0025] Further, the tail gas collection system 1 is provided with tail gas and tail gas condensate collection pipelines connecting the chlorosilane storage tank unit, the recovery unit, the rectification unit and the cold hydrogenation unit.

[0026] Further, the condensation system 3 is con...

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Abstract

The invention discloses a system and method for recycling the chlorosilane tail gas. The system comprises a tail gas collection system, a reaction system and a condensing system, wherein the above tail gas collection system, the reaction system and the condensing system are sequentially connected. The reaction system comprises a reaction tower. The upper part and the lower part of the reaction tower are filled with a filler layer respectively, and the middle part of the reaction tower is provided with a catalyst layer. The bottom of the reaction tower is connected with a reboiler and a liquid-phase silicon tetrachloride supplementing pipe. The recycled tail gas comprises the following components: dichlorosilane, trichlorosilane, silicon tetrachloride and a very small amount of hydrogen and hydrogen chloride. During the reaction process, the dichlorosilane, the trichlorosilane and the silicon tetrachloride are completely converted into trichlorosilane and the trichlorosilane returns to a rectification unit to be re-purified. The very small amount of hydrogen and hydrogen chloride are finally subjected to the three waste treatment. In this way, the material recycling rate of the tail gas reaches 95% or more. The material loss is greatly reduced. Meanwhile, the processing pressure of three wastes is greatly reduced.

Description

technical field [0001] The invention belongs to the field of polysilicon production, and in particular relates to a system and method for recovering and treating chlorosilane tail gas. Background technique [0002] my country's polysilicon industry started in the 1950s and achieved industrialization in the mid-1960s. The development of electronic information and solar photovoltaic industry has led to the growth of demand for polysilicon, especially against the background of the rapid development of the domestic solar industry, the new installed capacity of photovoltaics that continues to exceed market expectations has driven strong demand for components, resulting in a substantial increase in demand for upstream raw material polysilicon . [0003] The improved Siemens method is the mainstream process for producing polysilicon today: metallurgical grade silicon powder and hydrogen chloride (or silicon tetrachloride, hydrogen) react in the reactor to form trichlorosilane, the...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
CPCC01B33/1071
Inventor 陈静刘华鹏张鹏许国华田洪先高明
Owner YICHANG CSG POLYSILICON CO LTD