N-type back junction double-sided solar cell manufacturing method
A double-sided solar cell, n-type technology, applied in the field of solar cells, can solve problems such as parasitic absorption, and achieve the effects of improving cell efficiency, simple preparation method, and improving cell conversion efficiency
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[0024] refer to figure 1 , figure 1 It is a flow chart of the preparation of the battery of the embodiment of the present invention.
[0025] (1) In step 101, with pure SiH 4 and H 2 Intrinsic amorphous silicon 202 is deposited on a clean single crystal silicon substrate 201 as a reaction gas, and then n-type amorphous silicon oxide 203 and n-type amorphous silicon 204 are sequentially deposited on the amorphous silicon 202, such as figure 2 shown. The conditions for VHF-PECVD preparation of intrinsic amorphous silicon are: the background vacuum is higher than 10 -3 Pa, substrate temperature 200°C, gas SiH 4 The flow rate is 15sccm, H 2 The flow rate is 20sccm, the pressure is 0.4mbar, and the deposition power is 50mW / cm 2 , the prepared intrinsic amorphous silicon buffer layer 202 has a thickness of 5-10 nm. The conditions for preparing n-type amorphous silicon oxide by VHF-PECVD are: the background vacuum is higher than 10 -3 Pa, substrate temperature 200°C, gas Si...
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