Compact type flexible substrate magneto-controlled sputter coating equipment and method

A magnetron sputtering coating and flexible substrate technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc., can solve the problem that the ion source working gas cannot be effectively discharged, affecting the working atmosphere of the equipment, The problem of large equipment volume is achieved to prevent the mutual influence of the working atmosphere, improve the space utilization rate, and the effect of simple internal structure

Active Publication Date: 2016-10-26
ZHAOQING KERUN VACUUM EQUIP
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] (1) The production line is generally equipped with multiple coating chambers for multiple coatings on the surface of flexible substrates or multi-layer coatings of different types of films. Multiple coating chambers are generally installed side by side in a linear structure. The equipment is large in size and occupies an area Also large, high equipment cost
[0005] (2) Before coating the flexible substrate, the surface of the flexible substrate is usually treated with an ion source to remove impurities on the surface of the substrate and improve its surface appearance. However, due to the vacuum requirements of the coating chamber, the working gas of the ion source is often Without effective discharge, it is easy to affect the working atmosphere of other working mechanisms in the equipment

Method used

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  • Compact type flexible substrate magneto-controlled sputter coating equipment and method
  • Compact type flexible substrate magneto-controlled sputter coating equipment and method
  • Compact type flexible substrate magneto-controlled sputter coating equipment and method

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Embodiment 1

[0035] In this embodiment, a compact flexible substrate magnetron sputtering coating equipment, such as figure 1As shown, it includes a vacuum chamber, a flexible substrate winding mechanism, a magnetron sputtering device, a heater and an ion source. There is a partition partition in the vacuum chamber, and the partition partition divides the space in the vacuum chamber into a winding area and a coating area. , the partition board is provided with a through hole for the passage of the flexible substrate, the flexible substrate runs through the entire vacuum chamber, the heater and the ion source are arranged in the winding area, and the magnetron sputtering device is arranged in the coating area; A plurality of unit partitions are arranged in the coating area, and the space in the coating area is divided into a flexible substrate conveying unit and a plurality of coating units by the plurality of unit partitions. Among them, the partition partition divides the inner cavity of ...

Embodiment 2

[0050] This embodiment is a compact flexible substrate magnetron sputtering coating equipment. Compared with Embodiment 1, the difference is that the vacuum chamber is a rectangular cavity structure, and the partition partitions are horizontally arranged in the vacuum chamber, and the vacuum The indoor space is divided into a winding area and a coating area in a layered structure.

[0051] According to the site requirements of the actual production line, the vacuum chamber can also be designed as a cylindrical or other shaped cavity structure.

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Abstract

The invention discloses compact type flexible substrate magneto-controlled sputter coating equipment and method. According to the equipment, a partition clapboard is arranged in a vacuum chamber, space in the vacuum chamber is divided into a winding area and a coating area, the partition clapboard is provided with a through hole for a flexible substrate to pass through, the flexible substrate penetrates the whole vacuum chamber, a heater and an ion source are arranged in the winding area, a magneto-controlled sputter device is arranged in the coating area, multiple unit clapboards are arranged in the coating area, and space in the coating area is divided into one flexible substrate conveying unit and multiple coating units. According to the method, the winding area and the coating area in the vacuum chamber are vacuumized, and the flexible substrate unwound by an unwinding roller passes through the winding area firstly, and is subjected to ion treatment and preheating in the winding area, then conveyed into the coating area, subjected to sputter coating through the multiple coating units in sequence and finally conveyed to the winding area to be wound through a winding roller. The equipment is compact in structure, saves equipment cost and can effectively prevent work atmospheres of the different process stages from influencing one another.

Description

technical field [0001] The invention relates to the technical field of flexible substrate coating, in particular to a compact flexible substrate magnetron sputtering coating equipment and method. Background technique [0002] With the development of modern industrial technology, the demand for coating on flexible substrates is increasing. The flexible substrate film not only has the photoelectric characteristics of the rigid substrate film, but also has the advantages of light weight, foldable, unbreakable, easy to transport, and less investment in equipment. It is widely used in high-performance car film, plasma TV flat panel display, touch screen, solar battery and other fields. According to different application requirements, the functional requirements of the coated film layer are also different, but in general, the functional requirements of various industries for flexible substrate films are becoming higher and higher, and the film structure also tends to become more ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/54C23C14/56
CPCC23C14/35C23C14/54C23C14/541C23C14/56
Inventor 朱建明李金清
Owner ZHAOQING KERUN VACUUM EQUIP
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