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Chemistry-free negative image photosensitive composite suitable for UV-CTP

A chemical-free, UV-CTP technology, applied to photosensitive materials used in optomechanical equipment, etc., can solve harmful and other problems, and achieve the effects of good lipophilicity, high printing resistance, and high sensitivity

Inactive Publication Date: 2016-10-26
XINGRAPHICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the addition of diazo compounds and resins is detrimental to plates intended for "no treatment" plates

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] The chemical-free negative photosensitive composition suitable for UV-CTP of the present invention mainly includes the following six components: (1) an unsaturated water-soluble polymer of -(X)-(Y)-(Z)-structure , and (2) a photopolymerizable prepolymer, and (3) a polyfunctional monomer, and (4) one or more photopolymerization initiators, and (5) one or one More than one kind of dyes or pigments, and (6) one or more solvents; wherein, X represents a copolymerization unit containing a sulfonic acid group, and Y represents a branched carboxylic acid copolymerization unit containing two unsaturated double bonds , Z represents an acrylate copolymerized unit containing an unsaturated double bond branch.

[0022] In the present invention, X is selected from ethylenesulfonic acid and isoprenesulfonic acid. X accounts for 15% molar ratio of the copolymer. Y is a branched acrylic or methacrylic copolymerized unit containing two unsaturated double bonds. Alternatively, Y is a ...

Embodiment 2

[0026] The -(X)-(Y)-(Z)-structure polymer in the photosensitive composition of the present invention is a water-soluble polymer containing an unsaturated double bond. Among them, X represents a copolymerization unit containing sulfonic acid groups, Y represents a carboxylic acid copolymerization unit containing two unsaturated double bond branches, and Z represents an acrylate copolymerization unit containing one unsaturated double bond branch chain.

[0027] As the copolymerized unit represented by X, any compound may be used as long as it is a compound containing an ethylenically unsaturated group and a sulfonic acid group. The ethylenically unsaturated group guarantees copolymerization with other units, and the sulfonic acid group ensures better water solubility. X may be selected from ethylenesulfonic acid, isoprenesulfonic acid and the like. The proportion of X in the whole polymer is in the range of 15% to 20% molar ratio, preferably 17% to 20%. When it is lower than 1...

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PUM

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Abstract

The invention discloses a chemistry-free negative image photosensitive composite suitable for UV-CTP. The chemistry-free negative image photosensitive composite suitable for UV-CTP comprises (1) an unsaturated water-soluble polymer with -(X)-(Y)-(Z)- structure, and the photosensitive composite is characterized in that X represents a copolymerization unit containing a sulfonic acid group, Y represents a carboxylic acid copolymerization unit containing branches of two unsaturated double bonds, Z represents acrylic ester copolymerization unit containing one unsaturated double bond branch; and the photosensitive composite also comprises (2) a photopolymerisable prepolymer, (3) a polyfunctional monomer, (4) one or more than one initiators for photopolymerization, and (5) one or more than one dyes or pigments. In the invention, after the photosensitive composite is used, photosensitivity of a lithograph plate is high, dot reducibility is good, after exposure through an ultraviolet light source, the plate can be directly washed with tap water or being printed on a machine without being treated by any washing processing step, and long press life can be realized.

Description

technical field [0001] The invention relates to a UV-CTP, in particular to a chemical-free negative photosensitive composition suitable for UV-CTP. Background technique [0002] As we all know, the plate-making process of lithographic plates requires at least two steps to complete. One is to expose the printing plate coated with the photosensitive composition to a specific light source through a mask (such as a positive film type and a negative film type mask), thereby And form a light image latent image; the second is to carry out a so-called subsequent development step on the printing plate after the upper exposure, through this process, remove the excess coating. Pre-coated photosensitive lithography is a sheet-like material supported by aluminum or polyester, and can be prepared through the above two steps to have both lipophilic and hydrophilic surfaces, suitable for lithographic printing. Typically, in a negative-type system, the exposed areas become insoluble or inso...

Claims

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Application Information

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IPC IPC(8): G03F7/004
CPCG03F7/004
Inventor 黎仕友刘亚林黄永生杨志荣
Owner XINGRAPHICS CO LTD