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A workbench self-adaptive leveling device

A leveling device and self-adaptive technology, which is applied in the photolithographic process exposure device, the photographic process of the pattern surface, optics, etc. It is not suitable for automatic alignment and positioning lithography machines, complex structures, etc., and achieves the effects of self-adaptive leveling, stability, reliability, compact structure, and small size

Active Publication Date: 2017-10-31
SHENZHEN SIDEA SEMICON EQUIP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to manufacturing and assembly errors and the plane error of the lithography mask, it is impossible to ensure that the wafer and the lithography mask are in hard contact and completely bonded. There is a wedge-shaped angle between the wafer coating surface and the mask pattern surface. For this wedge angle, the workbench must have an adaptive leveling function to compensate for manufacturing, processing and other errors, and ensure that the wafer is in close contact with the photolithography mask
[0004] At present, the leveling mechanism configured in domestic lithography machines has a complex structure, large volume, and heavy weight. It can only be applied to manual alignment and positioning lithography machines, and is not suitable for automatic alignment and positioning lithography machines.

Method used

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  • A workbench self-adaptive leveling device
  • A workbench self-adaptive leveling device
  • A workbench self-adaptive leveling device

Examples

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Embodiment Construction

[0040] The preferred embodiments of the invention will be further described in detail below.

[0041] Such as Figures 1 to 13 As shown, an embodiment of an adaptive leveling device for a workbench includes: a base 3 , an orbiting mechanism 1 , an elastic mechanism 2 and a slide table 4 .

[0042] The base 3 includes a base plate 31 , an upper ball plunger 35 , a lower ball plunger 34 , a lower limit fixing block 33 , an anti-loosening set screw 37 , a locking screw 38 , a gasket 39 and a bearing guide support 32 . The lower ball plunger 34 is installed on the base plate 31, and the upper ball plunger 35 is installed on the lower limit fixing block 33. In one embodiment, there are three lower limit fixing blocks 33, which are evenly distributed on a certain part of the base plate 31. On the circumference (120° between the adjacent lower limit fixed blocks 33), it is used to limit the upper and lower positions of the orbiting mechanism 1 (that is, to limit the leveling plate 1...

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Abstract

The invention discloses a workbench self-adaptive leveling device, which comprises a forced nutation mechanism and an elastic mechanism. The forced nutation mechanism comprises a leveling board. The elastic mechanism comprises an elastic support, an elastic mechanism spindle and multiple elastic-mechanism elastic parts. The multiple elastic-mechanism parts are respectively arranged at different stress positions of the elastic support. Under the state of stress, the leveling board applies force on the corresponding elastic-mechanism elastic part at a certain stress position of the elastic support. The stress positions except the certain stress position on the elastic support can rotate around the elastic mechanism spindle towards the leveling board, and elastic force is applied on the leveling board through the corresponding elastic-mechanism elastic part. The device provided by the invention has advantages of small size, light weight and stable and reliable structure, relates to the technical field of contact-type lithography equipment, and is suitable for both manual alignment and automatic alignment.

Description

【Technical field】 [0001] The invention relates to a workbench self-adaptive leveling device. 【Background technique】 [0002] The lithography machine table contact lithography adaptive leveling mechanism is the key mechanism in the alignment of the core components of the lithography machine. This mechanism directly reflects the technical level of the lithography machine's development, production, manufacturing, and assembly. The core technology of the machine. [0003] The basic application principle of the contact lithography of the lithography machine: the self-adaptive leveling mechanism is installed on the Z table, and the self-adaptive leveling mechanism is installed on the carrier table for placing wafers. The photolithography mask is fixed above the workbench; during work, the wafer is required to be in close contact with the photolithography mask by controlling the Z worktable to rise and contact the photolithography mask, and then copy the pattern of the mask to the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70725
Inventor 韦日文王胜利胡泓
Owner SHENZHEN SIDEA SEMICON EQUIP
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