A kind of rc-ligbt device and preparation method thereof

A device and dielectric layer technology, which is applied in the field of power semiconductor integrated circuits, can solve the problems that the PN junction cannot be opened normally, affects the stability and reliability of LIGBT devices, and the PN junction conduction voltage drop increases.

Active Publication Date: 2019-05-10
UNIV OF ELECTRONIC SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Under low temperature conditions, the turn-on voltage drop of the PN junction formed by the P-type collector region 8 and the N-type electric field cut-off region 7 increases, and it needs to be turned on under a larger current condition, resulting in a more obvi

Method used

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  • A kind of rc-ligbt device and preparation method thereof
  • A kind of rc-ligbt device and preparation method thereof
  • A kind of rc-ligbt device and preparation method thereof

Examples

Experimental program
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Embodiment 1

[0034] This embodiment provides an RC-LIGBT device with a voltage level of 400V, and its cell structure is as follows figure 2 As shown, it includes a substrate 1, a silicon oxide dielectric layer 2 on the substrate 1, an N-type drift region 3 on the silicon oxide dielectric layer 2, an emitter structure on the N-type drift region 3, a gate structure, The collector structure and the first dielectric layer 14; the emitter structure is composed of a P-type base region 4, an N+ source region 5, a P+ contact region 6 and a metal emitter 12, wherein the P-type base region 4 is set on the N-type drift In region 3 and located on the left side of its top, P+ contact region 6 and N+ source region 5 are independently arranged in P-type base region 4, and the front surfaces of P+ contact region 6 and N+ source region 5 are both in phase with metal emitter 12 Contact; the gate structure is located on the side of the emitter structure and consists of a gate dielectric 10 and a polysilicon...

Embodiment 2

[0037] This embodiment provides an RC-LIGBT device with a voltage level of 400V, and its cell structure is as follows image 3 As shown, it includes a substrate 1, a silicon oxide dielectric layer 2 on the substrate 1, an N-type drift region 3 on the silicon oxide dielectric layer 2, an emitter structure on the N-type drift region 3, a gate structure, A collector structure and a dielectric layer 14; the emitter structure is composed of a P-type base region 4, an N+ source region 5, a P+ contact region 6 and a metal emitter 12, wherein the P-type base region 4 is arranged in the N-type drift region 3 and located on the left side of its top, the P+ contact region 6 and the N+ source region 5 are independently arranged in the P-type base region 4, and the front surfaces of the P+ contact region 6 and the N+ source region 5 are in contact with the metal emitter 12; The gate structure is located on the right side of the emitter structure and is composed of a gate dielectric 10 and ...

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Abstract

The invention belongs to the field of power semiconductor integrated circuits, and specifically provides a reverse conducting insulated gate bipolar transistor (Reverse Conducting-LIGBT, RC-LIGBT) and a preparation method thereof, which are used to suppress the negative resistance (snapback) of a traditional RC-LIGBT device phenomenon, while improving the characteristics of the reverse diode, improving the stability and reliability of the device. The RC-LIGBT device of the present invention completely shields the influence of the N-type collector region on the conduction characteristics through the composite structure introduced at the collector terminal of the device in the forward LIGBT working mode, completely eliminates the negative resistance (snapback) phenomenon, and It has the same low turn-on voltage drop as the traditional LIGBT, which improves the stability and reliability of the device; at the same time, it provides a low-resistance freewheeling channel at the collector terminal in the reverse diode freewheeling mode, optimizing its freewheeling capability with a small turn-on voltage drop.

Description

technical field [0001] The invention belongs to the field of power semiconductor integrated circuits, and relates to a lateral insulated gate bipolar transistor (Lateral Insulated Gate Bipolar Transistor, LIGBT), in particular to a lateral reverse conduction type insulated gate bipolar transistor (Reverse Conducting-LIGBT, RC-LIGBT) and its preparation method. Background technique [0002] Lateral Insulated Gate Bipolar Transistor (LIGBT) is a new type of device in power integrated circuits. It not only has the advantages of LDMOSFET easy to drive, simple control, and easy integration, but also has the advantages of reduced conduction voltage of power transistors, large on-state current, and low loss. It has become one of the core devices of modern power semiconductor integrated circuits. Literature (Shigeki T., Akio N., Youichi A., Satoshi S. and Norihito T. Carrier-Storage Effect and Extraction-Enhanced Lateral I GBT (E 2 LIGBT): A Super-High Speed ​​and Low On-state Vol...

Claims

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Application Information

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IPC IPC(8): H01L29/739H01L29/06H01L21/331
CPCH01L29/0623H01L29/66325H01L29/7393
Inventor 张金平熊景枝刘玮琪刘竞秀李泽宏任敏张波
Owner UNIV OF ELECTRONIC SCI & TECH OF CHINA
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