Method for manufacturing low-resistance protective layer of chip type thin film fixed resistor
A technology of fixed resistance and manufacturing method, applied in coating, metal material coating process, ion implantation plating, etc., can solve the problem of uneven surface reaction of resistor body film layer, batch pass rate can only reach 70%, heat treatment Problems such as large temperature differences can achieve the effects of improving delivery efficiency, increasing heat treatment temperature, and improving TCR pass rate
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[0014] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention.
[0015] Implementation of the method employs SiO 2 As a target, a uniform layer of SiO was deposited on the nickel-chromium resistor film by radio frequency magnetron sputtering. 2 The protective film layer, the specific steps are as follows:
[0016] 1. Deposit the nickel-chromium resistor body film layer by DC magnetron sputtering on the substrate with the surface, the back electrode and the barrier layer (or mask layer);
[0017] 2. Put the sputtered substrate into the SCP-6 radio frequency magnetron sputtering coating machine, and load the SiO2 target, and then turn on the equipment;
[0018] 3. When the low vacuum reaches 2.0x10-3Pa~6.0x10-4Pa, enter Ar (20sccm~50sccm), turn on the substrate rotation (10Hz~30Hz), turn on the radio frequency power supply (RF2500W, 15.6MHz) and the automati...
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