Crystal pulling method for single crystal by Czochralski pulling
A single crystal and Czochralski technology, applied in the direction of single crystal growth, single crystal growth, chemical instruments and methods, etc., can solve the problems of high cost and low yield of single crystal, and achieve the goal of improving the yield of crystal pulling, The effect of reducing production costs and improving crystal quality
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Embodiment 1
[0028] A kind of crystal pulling method of Czochralski single crystal provided by the present invention comprises the following steps:
[0029] The first step, charging: mix the polysilicon raw material and the redrawing material in the quartz crucible according to the mass ratio of 2:1, and the polysilicon raw material is installed in the middle and the top of the quartz crucible, and close to the edge of the quartz crucible. For redrawing materials, it is necessary to ensure that the raw materials are packed compactly during the charging process, and the sharp parts of the raw materials cannot be directly facing the inner wall of the quartz crucible;
[0030] The second step, chemicals, specifically includes the following steps:
[0031] In the first step, when the chemical material is started, the heater operates at a conventional chemical material power of 75kW, and the quartz crucible rotates at 1 revolution / min of the conventional rotational speed;
[0032] In the secon...
Embodiment 2
[0040] A kind of crystal pulling method of Czochralski single crystal provided by the present invention comprises the following steps:
[0041] The first step, charging: mix the polysilicon raw material and the redrawing material in the quartz crucible according to the mass ratio of 3:1, and the polysilicon raw material is installed in the middle and the top of the quartz crucible, and it is placed near the edge of the quartz crucible. For redrawing materials, it is necessary to ensure that the raw materials are packed compactly during the charging process, and the sharp parts of the raw materials cannot be directly facing the inner wall of the quartz crucible;
[0042] The second step, chemicals, specifically includes the following steps:
[0043] In the first step, when the chemical material is started, the heater operates at a conventional chemical material power of 75kW, and the quartz crucible rotates at 1 revolution / min of the conventional rotational speed;
[0044] In ...
Embodiment 3
[0052] A kind of crystal pulling method of Czochralski single crystal provided by the present invention comprises the following steps:
[0053] The first step, charging: mix the polysilicon raw material and the redrawing material in the quartz crucible according to the mass ratio of 4:1, and the polysilicon raw material is installed in the middle and top of the quartz crucible, and the quartz crucible is placed near the edge. For redrawing materials, it is necessary to ensure that the raw materials are packed compactly during the charging process, and the sharp parts of the raw materials cannot be directly facing the inner wall of the quartz crucible;
[0054] The second step, chemicals, specifically includes the following steps:
[0055] In the first step, when the chemical material is started, the heater operates at a conventional chemical material power of 75kW, and the quartz crucible rotates at 1 revolution / min of the conventional rotational speed;
[0056] In the second...
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