Nano-pillar LED grown on strontium tantalum lanthanum aluminate substrate and preparation method thereof
A technology of strontium tantalum lanthanum aluminate and nano-pillars, applied in electrical components, circuits, semiconductor devices and other directions, can solve problems such as unstable chemical properties of substrates, and achieve the effects of eliminating adverse effects, reducing growth difficulty, and reducing production costs.
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Embodiment 1
[0049] The preparation method of the nanocolumn LED grown on the strontium tantalum lanthanum aluminate substrate of this embodiment comprises the following steps:
[0050] (1) Selection of the substrate and its crystal orientation: using La 0.3 Sr 1.7 AlTaO 6 The substrate, with the (111) plane offset from the (100) direction by 0.5-1° as the epitaxial plane, the crystal epitaxial orientation relationship is: the (0001) plane of GaN is parallel to the La 0.3 Sr 1.7 AlTaO 6 (111) side;
[0051] (2) Substrate surface polishing, cleaning and annealing treatment, the specific process of the annealing is: put the substrate into the annealing chamber, and treat La 0.3 Sr 1.7 AlTaO 6 The substrate was annealed for 3 hours and then air-cooled to room temperature;
[0052] The surface polishing of the substrate is specifically: firstly La 0.3 Sr 1.7 AlTaO 6 The surface of the substrate is polished with diamond slurry, and the surface of the substrate is observed with an opt...
Embodiment 2
[0066] The preparation method of the nanocolumn LED grown on the strontium tantalum lanthanum aluminate substrate of this embodiment comprises the following steps:
[0067] (1) Selection of the substrate and its crystal orientation: using La 0.3 Sr 1.7 AlTaO 6 The substrate, with the (111) plane offset from the (100) direction by 0.5-1° as the epitaxial plane, the crystal epitaxial orientation relationship is: the (0001) plane of GaN is parallel to the La 0.3 Sr 1.7 AlTaO 6 (111) side;
[0068] (2) Substrate surface polishing, cleaning and annealing treatment, the specific process of the annealing is: put the substrate into the annealing chamber, and treat La 0.3 Sr 1.7 AlTaO 6 The substrate was annealed for 5 hours and then air-cooled to room temperature;
[0069] The surface polishing of the substrate is specifically: firstly La 0.3 Sr 1.7 AlTaO 6 The surface of the substrate is polished with diamond slurry, and the surface of the substrate is observed with an opt...
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