Photosensitive resin composition containing oxime ester photoinitiator and application of photosensitive resin composition
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD
- Publication Date
- 2017-02-22
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to the field of organic chemistry, in particular to a photosensitive resin composition containing an oxime ester photoinitiator and its preparation of color filter film (RGB), black matrix (BM), photoresist, and photospacer (photo-spacer), rib (rib) and dry film applications. Background technique
[0002] In display devices such as liquid crystal displays, the liquid crystal layer is usually arranged between two substrates, and electrodes facing each other are arranged on each substrate, and on the inside of one of the substrates, opposite to the liquid crystal layer, red (R), A color filter layer formed by each pixel of green (G), blue (B), and black. Among them, the color weights of R, G, and B colors are usually distinguished in the form of setting matrix.
[0003] At present, the methods for producing color filters mainly include dyeing method, printing method, pigment dispersion method and anode method, among which the pigm...