Photosensitive resin composition containing oxime ester photoinitiator and application of photosensitive resin composition

Abstract

The invention discloses a photosensitive resin composition, which comprises ultraviolet photosensitive prepolymer resin, an active diluent monomer, a photoinitiator and an optional coloring agent, wherein the photoinitiator is selected from at least one of an oxime ester compound as shown in a formula (I) and a derivative compound by employing the compound as shown in the formula (I) as a main body structure. The composition has high photosensibility, good developing performance, high resolution ratio and excellent sealing property with a substrate, is very suitable for preparation of a black matrix with high shading performance, a high-precision and high-quality color filter and a liquid crystal display device, and can be used in the aspects of a light spacer, a ribbed bar, a photoresist, a dry film and the like. The formula is as shown in the specification.

Description

technical field [0001] The invention belongs to the field of organic chemistry, in particular to a photosensitive resin composition containing an oxime ester photoinitiator and its preparation of color filter film (RGB), black matrix (BM), photoresist, and photospacer (photo-spacer), rib (rib) and dry film applications. Background technique [0002] In display devices such as liquid crystal displays, the liquid crystal layer is usually arranged between two substrates, and electrodes facing each other are arranged on each substrate, and on the inside of one of the substrates, opposite to the liquid crystal layer, red (R), A color filter layer formed by each pixel of green (G), blue (B), and black. Among them, the color weights of R, G, and B colors are usually distinguished in the form of setting matrix. [0003] At present, the methods for producing color filters mainly include dyeing method, printing method, pigment dispersion method and anode method, among which the pigm...

AI Technical Summary

Problems solved by technology

In general, it is necessary to improve the light-shielding properties of BM by increasing the film thickness or increasing the content of light-shielding pigments or dyes, but in the case where light-shielding properties are required in the entire light wavelength region, these measures tend to cause significant obstacles to the photosensitive properties of the composition The main manifestations are: there is a difference in crosslinking density between the exposed part and the unexposed part and the exposed bottom; the insoluble pigment in the developer reduces the developability, which leads to a decrease in the linearity of the pattern, or the pattern peels off, resulting in residue; etc.

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