Multi-beam laser interference micro-nano processing device and method based on Dammann grating and reflectors

Abstract

The invention relates to a multi-beam laser interference micro-nano processing device and method based on a Dammann grating and reflectors. The double-layer Dammann transmission grating is used as a beam splitter and divides a single laser beam which is collimated, expanded and shaped into multiple beams of coherent light, wherein the multiple beams of coherent light have the same amplitude intensity; besides, the reflectors on sliding ways are used for adjustment of the inclined angle between the light beams and selection of a processing period, and a light array achieving uniform intensity distribution of all grades of light is obtained; and the multiple beams of coherent light are gathered to the surface of a material to be processed to conduct interference, so that interference laser stripes are obtained, and therefore a periodical parallel-trench micro-nano structure is processed. The multi-beam laser interference micro-nano processing device and method based on the Dammann grating and the reflectors replaces a disperse type multi-support scheme in an existing system and greatly improves the convenience, reliability and efficiency of the system. The multi-beam laser interference micro-nano processing device and method based on the Dammann grating and the reflectors have the advantages that a light path is convenient to adjust, the processing size is controllable, the processing efficiency is high, the multi-beam laser interference micro-nano processing device and method based on the Dammann grating and the reflectors are suitable for low-cost mass production, and operation is easy.

Description

technical field [0001] The invention belongs to the field of laser interference micro-nano processing, in particular to a multi-beam laser interference micro-nano processing device and method based on Damman gratings and mirrors. Background technique [0002] Laser interference lithography is a method for processing submicron-scale periodic structures on a large area of ​​a material surface. Two or more beams of coherent light are used to form a periodic or quasi-periodic light field, which can directly etch two or more layers on the surface or inside of a material. 1D and 3D periodic structures. Laser interference lithography has the advantages of large processing area, flexible processing scale, and low cost, and has been highly valued by researchers. Nanostructures processed by laser interference lithography have also been widely used in many fields, but its There are still many defects in quality stability and practical application. [0003] The traditional Mach-Zehnde...

AI Technical Summary

Problems solved by technology

In addition, the processing error between the lenses in the manufacturing process will also affect the performance of the beam splitter

It can be seen that the existing multi-beam laser lithography technology generally adopts a discrete multi-stent scheme, the calibration process is cumbersome, and only a single period of nanostructure processing can be performed. To obtain interference patterns of other periods, the entire set of optical paths needs to be readjusted. The process is complicated and difficult to realize; at the same time, there are still disadvantages such as low diffraction efficiency and uneven light intensity distribution of interference fringes.

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