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Multistage Magnetic Field Arc Ion Plating Method for Lined Positively Biased Conical Tube

A technology of arc ion plating and arc plasma, which is applied in the field of material surface treatment, can solve the problems of low arc plasma transmission efficiency and large particle defects, so as to avoid large particle defects, improve crystal structure and stress state, and improve transmission efficiency Effect

Active Publication Date: 2019-08-13
ZHENGZHOU UNIVERSITY OF AERONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the traditional arc ion plating method using low-melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the arc plasma transmission efficiency caused by the curved magnetic filter technology. Low-level problems, combined with the multi-level magnetic field filtering method and the composite effect of the mechanical barrier shielding of the conical tube's own shape and the positive bias electric field attraction, at the same time ensure that the arc plasma passes through the conical tube and the multi-level magnetic field with high transmission efficiency The filtering device enables continuous and dense preparation of high-quality thin films on the surface of the workpiece under the condition of applying negative bias voltage, and at the same time realizes the control of element content in the thin film, reduces the production cost of using alloy targets, improves the deposition efficiency of thin films, and reduces large particle defects detrimental effect on film growth and properties, a multistage magnetic field arc ion plating method is proposed for lining positively biased conical tubes

Method used

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  • Multistage Magnetic Field Arc Ion Plating Method for Lined Positively Biased Conical Tube
  • Multistage Magnetic Field Arc Ion Plating Method for Lined Positively Biased Conical Tube

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specific Embodiment approach 1

[0015] Specific implementation mode one: the following combination figure 1 and 2 Describe the present embodiment, the device used in the multistage magnetic field arc ion plating method of lining positive bias conical tube in this embodiment includes bias power supply 1, arc power supply 2, arc ion plating target source 3, multistage magnetic field device 4, Multi-stage magnetic field power supply 5, lined positive bias conical tube device 6, positive bias power supply 7, sample stage 8, bias power supply waveform oscilloscope 9 and vacuum chamber 10;

[0016] The method includes the following steps:

[0017] Step 1. Place the substrate workpiece to be processed on the sample stage 8 in the vacuum chamber 10, and insulate the lining positive bias conical tube device 6 from the vacuum chamber 10 and the multi-stage magnetic field device 4. The workpiece and the sample stage 8 are connected to each other. The negative output end of the bias power supply 1, the arc ion plating...

specific Embodiment approach 2

[0026] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the method also includes:

[0027] Step 3: Thin films can be deposited by combining traditional DC magnetron sputtering, pulsed magnetron sputtering, traditional arc ion plating and pulsed cathodic arc with DC bias, pulse bias or DC pulse composite bias to prepare pure metal films , compound ceramic films with different element ratios, functional films and high-quality films with nano-multilayer or gradient structures.

specific Embodiment approach 3

[0028] Embodiment 3: The difference between this embodiment and Embodiment 2 is that Steps 1 to 3 are repeated to prepare multi-layered thin films with different stress states, microstructures and element ratios, and the others are the same as Embodiment 2.

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Abstract

The invention provides a multi-grade magnetic field electric arc ion plating method of a lining positive-biased tapered pipe and belongs to the technical field of material surface treatment, aiming at solving the problems of cleaning of pollution on a pipe inner wall caused by large particles and deposited ions in a multi-grade magnetic field filtering device and loss in an electric arc plasma transmission process. The method provided by the invention comprises the following steps: 1, putting a workpiece to be subjected to film plating into a sample platform in a vacuum chamber, and switching on a related power supply; starting an external water cooling system; 2, depositing a thin film: when the vacuum degree in the vacuum chamber is less than 10<-4>Pa, introducing working gas and adjusting gas pressure; starting up a film plating power supply; meanwhile, attracting electric arc plasmas at an outlet by utilizing a biased power supply and carrying out energy adjustment; effectively eliminating large-particle defects and guaranteeing the transmission efficiency of the electric arc plasmas through self stopping and shielding, and positive-biased electric field effects of the lining positive-biased tapered pipe, and multi-grade magnetic field filtering effect; setting needed technological parameters and preparing the thin film.

Description

technical field [0001] The invention relates to a multi-stage magnetic field arc ion plating method for a positively biased conical tube lined with a positive bias, and belongs to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, due to the arc spot current density as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the target surface, which is splashed out in the form of droplets under the action of local plasma pressure, and adheres to the surface of the film or is embedded in the film to form "macroparticles" (Macroparticles) Defects (BoxmanR L, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In the arc plasma, since the movement speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/32
CPCC23C14/325
Inventor 魏永强宗晓亚侯军兴张华阳刘源刘学申蒋志强冯宪章
Owner ZHENGZHOU UNIVERSITY OF AERONAUTICS
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