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Device and method for high-precision positioning of far focus of ellipsoidal mirror

A technology of ellipsoidal reflector and positioning device, which is applied in the direction of condenser, instrument, optics, etc., and can solve the problems of large coma, astigmatism, and high accuracy of assembly and adjustment.

Active Publication Date: 2019-04-19
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, since the collection aperture angle of the ellipsoidal reflector is very large, it requires extremely high adjustment accuracy. When the point source and the far focus of the ellipsoidal reflector deviate slightly in the radial direction, it will cause large coma aberration and Astigmatism, therefore, in order to take advantage of the large numerical aperture and strong contrast of the ellipsoidal reflector, it is necessary to fine-tune the ellipsoidal reflector

Method used

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  • Device and method for high-precision positioning of far focus of ellipsoidal mirror

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specific Embodiment 1

[0024] This embodiment is an embodiment of the high-precision positioning device for the far focus of the ellipsoidal reflector.

[0025] The high-precision positioning device for the far focus of the ellipsoid mirror in this embodiment has a schematic structural diagram as figure 1 shown. The high-precision positioning device for the far focus of the ellipsoid mirror includes a laser 1, a collimator beam expander 2, an attenuation plate 3, an image sensor 4, a tube mirror 5, a beam splitter 6, a plane mirror 7 and a focusing objective lens 8. The connecting optical path also includes an ellipsoidal reflector 9; the overlapping optical path is placed on a six-degree-of-freedom workbench 10, and the plane reflector 7 forms an angle of 45 degrees with the six-degree-of-freedom workbench 10, and the ellipsoidal reflector 9 is alone Fixed above the focusing objective lens 8, the focal point of the focusing objective lens 8 coincides with the far focus of the elliptical cross-sect...

specific Embodiment 2

[0026] This embodiment is an embodiment of a high-precision positioning method for the far focus of an ellipsoidal reflector.

[0027] The high-precision positioning method for the far focus of the ellipsoidal reflector in this embodiment is implemented on the high-precision positioning device for the far focus of the ellipsoidal reflector described in the first embodiment.

[0028] The high-precision positioning method of the far focus of the ellipsoidal reflector comprises the following steps:

[0029] Step a, turn on the laser 1, and use the attenuation sheet 3 to attenuate the intensity of the parallel light beam emitted from the collimator beam expander 2, so that the image sensor 4 can effectively image;

[0030] Step b. Continuously adjust the six-degree-of-freedom workbench 10 to obtain the intensity information and roundness information of the light spot collected by the image sensor 4 under different degrees of freedom;

[0031] Step c, combining the intensity infor...

specific Embodiment 3

[0034] This embodiment is an embodiment of a high-precision positioning method for the far focus of an ellipsoidal reflector.

[0035] The high-precision positioning method for the far focus of the ellipsoidal reflector in this embodiment, on the basis of the second embodiment, further defines step b as: setting the six degrees of freedom as N1, N2, N3, N4, N5, N6 discrete numerical values ​​are arranged and combined to obtain N1×N2×N3×N4×N5×N6 combinations. In each combination, the intensity information and roundness information of the light spot are obtained.

[0036] This embodiment provides a specific technical means for how to obtain series of intensity information and roundness information.

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Abstract

The invention discloses a high-precision positioning device and a high-precision positioning method for a far focus of an ellipsoidal reflector. The high-precision positioning device and the high-precision positioning method belong to the field of optical confocal microscopic technologies and optical precise measurement. The high-precision positioning device comprises a lapping optical path which is composed of optical elements such as laser devices, and further comprises an ellipsoidal reflector and the like. The high-precision positioning method comprises the steps of firstly, conducting effective imaging by means of an image sensor, then adjusting a six-degree-of-freedom workbench, acquiring a series of intensity information and roundness information of a light spot, merging the information into an evaluation function, establishing a degree-of-freedom and evaluation function table, finding out an extreme value of the evaluation function and a degree of freedom corresponding to the extreme value in the degree-of-freedom and evaluation function table, and finally adjusting the six-degree-of-freedom workbench according to the degree of freedom corresponding to the extreme value such that a focus of a focusing objective lens coincides with the far focus of the ellipsoidal reflector. The high-precision positioning device and the high-precision positioning method fully utilize the special property of the bifocal conjugation of the ellipsoidal reflector, and realize precise positioning of the ellipsoidal reflector through providing a technological means for positioning the far focus of the ellipsoidal reflector by utilizing the imaging light spot information.

Description

technical field [0001] The invention relates to a device and a method for high-precision positioning of the far focus of an ellipsoid mirror, which belong to the field of optical confocal microscopy technology and the field of optical precision measurement. Background technique [0002] With the development of microscopic technology, reflective microscopic imaging system has been paid more and more attention. The structures that can realize imaging under large numerical aperture angle are: parabolic mirror, hyperbolic mirror and ellipsoidal mirror. Ideally, the ellipsoidal mirror has the advantages of large numerical aperture and strong contrast, and has broad application prospects and commercial value in the field of optical confocal microscopy and optical precision measurement. [0003] However, since the collection aperture angle of the ellipsoidal reflector is very large, it requires extremely high adjustment accuracy. When the point source and the far focus of the elli...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B19/00
CPCG02B19/00G02B19/0028G02B19/0052
Inventor 刘俭李梦周李强谭久彬高姗
Owner HARBIN INST OF TECH