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Photolithography solution prediction method based on layout geometric feature matching

A solution and geometric feature technology, applied in the field of lithography solution prediction based on layout geometric feature matching, can solve problems such as inability to intuitively feedback layout design, inability to analyze unknown or undetected, and inability to provide unknown layout graphics, etc. Achieve the effect of shortening the development cycle, ensuring successful implementation, and reducing selection time

Active Publication Date: 2017-05-31
INST OF MICROELECTRONICS CHINESE ACAD OF SCI +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The embodiment of the present application provides a lithography solution prediction method based on layout geometric feature matching, which solves the problem that the prior art cannot analyze unknown or undetected geometric pattern combinations, and cannot provide pre-selection for process development for unknown layout patterns. solutions, and the inability to visually feedback layout design defects

Method used

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  • Photolithography solution prediction method based on layout geometric feature matching
  • Photolithography solution prediction method based on layout geometric feature matching
  • Photolithography solution prediction method based on layout geometric feature matching

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Embodiment 1

[0035] Embodiment 1 provides a lithography solution prediction method based on layout geometric feature matching, such as figure 1 As shown, the method includes:

[0036] S100: Obtain a standard layout geometric information database;

[0037] S200: Obtain geometric information of the layout to be matched;

[0038] S300: Match the layout geometric information to be matched with the geometric information in the standard layout geometric information database;

[0039] S400: Select a first standard layout according to the matching result;

[0040] S500: Using the lithography solution corresponding to the first standard layout as a candidate for the lithography solution of the layout to be matched, and predicting the lithography solution of the layout to be matched.

[0041] Embodiment 1 By establishing a standard layout geometric information database, the geometric information of the layout to be matched is obtained, and the statistical results of the geometric information of t...

Embodiment 2

[0045] Embodiment 2 provides a lithography solution prediction method based on layout geometric feature matching, the method comprising:

[0046] Obtain a standard layout geometric information database;

[0047] Obtain geometric information of the layout to be matched;

[0048] matching the layout geometric information to be matched with the geometric information in the standard layout geometric information database;

[0049] selecting a first standard layout according to the matching result;

[0050] The lithography solution corresponding to the first standard layout is used as a candidate lithography solution of the layout to be matched, and the lithography solution of the layout to be matched is predicted.

[0051] Wherein, said obtaining standard layout geometric information database includes:

[0052] Obtain the standard layout collection and the lithography solution corresponding to each standard layout in the collection;

[0053] Obtaining geometric information of t...

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Abstract

The invention belongs to the field of the semiconductor manufacturing technology, and discloses a photolithography solution prediction method based on layout geometric feature matching. The method includes the following steps that a standard layout geometric information database is obtained, to-be-matched layout geometric information is obtained, geometric information in the to-be-matched layout geometric information and geometric information in the standard layout geometric information database are matched, according to the matching result, a first standard layout is selected, a photolithography solution corresponding to the first standard layout serves as a photolithography solution candidate of a to-be-matched layout, and the photolithography solution of the to-be-matched layout is predicted. The method solves the problems that in the prior art, a unknown or untested geometric figure combination can not be analyzed, a pre-selected solution obtained by technological research and development can not be provided for an unknown layout graph, and the defects of the layout design can not be directly fed back. The method achieves the technical effects of providing a pre-selected solution obtained by technological research and development for the unknown layout graph, and the defects of the layout design are directly fed back.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a lithography solution prediction method based on layout geometric feature matching. Background technique [0002] With the improvement of semiconductor technology level and the growth of market demand, the complexity of very large scale integration (VLSI) design is getting higher and higher, and there are some unexpected adverse interactions between design layout and production process flow. Process imperfections lead to highly variable layout geometry feature sizes, making these interactions very difficult to predict. Ideally, a physical design layout verification step should be able to capture potential process defect-prone geometries in the layout. [0003] The function of traditional design rule checking (DRC) is based on a large number of pre-set fixed geometric size combination rules. By checking whether the graphic structure meets the requirements of ...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 韦亚一宋之洋郭沫然颜永利董立松苏晓菁刘实
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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