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Focusing and leveling device and method

A technology of focusing and leveling device and spatial light modulator, which is applied in the field of projection lithography, can solve the problems that the data cannot be reflected, and the height measurement value of the measured area cannot be truly reflected, so as to reduce the size of the spot and improve the utilization rate of light energy , Improve the effect of measurement accuracy

Active Publication Date: 2019-01-29
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] The present invention provides a focusing and leveling device and method to solve the problem that the measured data cannot reflect or truly reflect the measured height measurement value of the measured area due to dense process grooves appearing on the local surface of the workpiece to be measured.

Method used

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  • Focusing and leveling device and method
  • Focusing and leveling device and method
  • Focusing and leveling device and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0055] The focusing and leveling device (FLS) of this embodiment is as follows Figure 4 As shown, it specifically includes: an illumination unit, a projection optical path, an imaging optical path, a detector 116, and a control terminal. The surface of the workpiece 103 is reflected and emitted to the imaging optical path, and then enters the detector 116 for imaging. After the control end obtains the defocus amount of the surface of the measured workpiece 103 according to the imaging information, and controls the movement of the workpiece table 104, the The surface of the measured workpiece 103 is adjusted to the best exposure surface within the allowable range of error; a spatial light modulator 107 is provided between the illumination unit and the projection optical path, and a plurality of light-through light modulators 107 are provided on the spatial light modulator 107 The slit 1071, the measurement beam forms a plurality of measurement spots after passing through the s...

Embodiment 2

[0077] The difference between this embodiment and Embodiment 1 is that in this embodiment, the spatial light modulator 107 is a grating mode, and the grating mode can be as follows Figure 10 , 11 As shown, changing the single light-passing slit 1071 into a grating mode can also be as Figure 12 As shown, several light-passing slits are formed into a grating. In this way, when some grating spots in the spatial light modulator fail, some other gratings will not fail. In addition, without changing the structure of the optical path, the number of sub-spots for measurement can be increased through the spatial light modulator 107 according to the actual and different requirements for measurement accuracy in different working conditions, such as Figure 10 , 11 As shown in , 12, the number of light spots in the figure is only different from the number of three light spots, and the actual working conditions can be increased or decreased according to the needs. The detector only n...

Embodiment 3

[0079] The difference between this embodiment and Embodiments 1 and 2 is that this embodiment is suitable for a focusing and leveling system for multi-point measurement with a large field of view, and at the same time, it can also weaken the influence of the detector from temperature drift and improve the measurement accuracy of the sensor .

[0080] Such as Figure 13 As shown, in addition to the first illumination unit E1, the first spatial light modulator 107, the projection optical path E2, and the detection optical path E3, the focusing and leveling device of this embodiment includes a reference optical path, which has the same structure as that of the first embodiment. The reference optical path includes a second spatial light modulator 107' and a second illumination unit E1', the second spatial light detector 107' is arranged between the second illumination unit E1' and the detection optical path E3, and the first The two spatial light modulators 107' are provided with...

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Abstract

The invention discloses a focusing and leveling apparatus and method. The focusing and leveling apparatus comprises a first illumination unit, a projection light path, an imaging light path, a detector and a control end, wherein the first illumination unit provides a measurement light beam; the measurement light beam passes through the projection light path, and then comes into the surface of a tested workpiece, and then is reflected by the surface of the tested workpiece and exits to the imaging light path; next, the light beam enters the detector to be imaged; the control end obtains defocusing amount of the surface of the tested workpiece according to the imaging information and then controls movement of a workpiece table to adjust the surface of the tested workpiece into an optimal exposure surface within an error allowable range; a first space optical modulator is arranged between the first illumination unit and the projection light path; a plurality of light-passing slits are formed in the first space optical modulator; and the measurement light beam passes through the first space optical modulator to form multiple measurement light spots. By virtue of the focusing and leveling apparatus and method, the technological adaptability and measurement precision of the focusing and leveling apparatus can be effectively improved, and yield of the finished product can be improved.

Description

technical field [0001] The invention relates to the field of projection lithography, in particular to a focusing and leveling device and method. Background technique [0002] Projection lithography machine or projection lithography equipment is a device that projects the pattern on the mask onto the surface of the workpiece through the projection objective lens. In projection lithography equipment, there must be an automatic focusing and leveling device to guide the workpiece table to accurately move the workpiece surface to a designated exposure position. There are many different technical solutions for the automatic focusing and leveling control function of the automatic focusing and leveling device. At present, the non-contact photoelectric measurement technology is more commonly used. [0003] The photoelectric detection scheme based on the image sensor is a relatively mature non-contact photoelectric measurement technology scheme. The position correspondence of the im...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F9/00G03F7/20
CPCG03F7/70358G03F9/7026G03F9/7034
Inventor 唐平玉
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD