An online monitoring device for grinding and polishing processing status
A monitoring device and processing state technology, applied in the field of precision and ultra-precision machining, can solve the problems of large influence by external interference, complex structure, low precision, etc., and achieve the effects of low equipment requirements, low cost and convenient operation.
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Embodiment 1
[0024] For example, during the grinding and polishing process, the acoustic emission sensor installed on the wafer carrier collects the acoustic emission signal generated by the abrasive particles and the workpiece, and the weak current signal obtained by the sensor is amplified and filtered through the signal conditioning circuit, and the data is collected. The device collects the processed analog voltage signal with a sampling rate of 2M and a resolution of 16 bits, and converts it into a digital signal and transmits it to the computer for display and storage. By analyzing the signal on the computer side, such as performing wavelet transformation on the signal, when the signal characteristics corresponding to the scratch defect of the workpiece appear, the operator can perform appropriate operations on the grinding and polishing process to improve the processing status of the grinding and polishing; The mathematical relationship between the intensity of the emission signal an...
Embodiment 2
[0026] For example, in the process of chemical mechanical polishing, the load sensor installed on the wafer carrier collects the resistance in the horizontal direction between the workpiece and the polishing pad, and the electrical signal collected by the sensor is amplified and filtered through the signal conditioning circuit. The 16-bit resolution of the data collector collects the processed analog voltage signal, converts it into a digital signal and transmits it to the computer to realize the display and storage functions. By analyzing the signal on the computer side, such as using the friction resistance in the horizontal direction of the workpiece and the pressure in the vertical direction, the friction coefficient between the workpiece and the polishing pad can be calculated, and the polishing liquid can be obtained by comparing the friction coefficients obtained by different calculations. To determine the type of softened layer qualitatively produced by the chemical act...
Embodiment 3
[0028] For example, during the grinding and polishing process, the acceleration sensor installed on the wafer carrier collects the vibration signal of the wafer carrier and the workpiece, and the signal conditioning circuit performs necessary amplification and filtering on the electrical signal collected by the sensor. The data collector The processed analog voltage signal is collected with 16-bit resolution, converted into digital signal and transmitted to the computer to realize display and storage functions. By analyzing the signal on the computer side, such as vibration signal strength analysis, a relationship model between vibration signal strength and surface roughness is established, and the surface roughness of the processed workpiece is estimated by calculating the vibration signal strength.
[0029] The working principle of the present invention is:
[0030] Such as figure 1 shown.
[0031] 1. When grinding and polishing, the grinding and polishing pad on the ring ...
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