Mask plate including monitoring pattern and monitoring method

A mask plate and graphics technology, which is applied to the photoplate making process of the pattern surface, the original parts used for photomechanical processing, and instruments, can solve the problems of mask plate quality misjudgment and low yield rate of semiconductor products, and achieve Avoid the loss of product yield and improve the effect of reliability

Active Publication Date: 2020-06-09
SEMICON MFG INT (SHANGHAI) CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the prior art, the reliability of the method for detecting the mask plate needs to be further improved, and there is a problem of misjudgment of the quality of the mask plate, resulting in a low yield rate of semiconductor products

Method used

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  • Mask plate including monitoring pattern and monitoring method
  • Mask plate including monitoring pattern and monitoring method
  • Mask plate including monitoring pattern and monitoring method

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Embodiment Construction

[0035] It can be known from the background art that in the prior art, after the geometrical figure defining the design pattern is formed on the mask plate, the subsequent process of semiconductor manufacturing is performed with the mask plate, which easily brings loss to the product yield.

[0036]After the design pattern is defined in the mask, the monitoring means of the mask is usually to monitor the top view of the mask (mask top view). Specifically, first obtain the top view of the mask with the design pattern defined SEM (Scan Electron Microscope) diagram of the view. When there is no problem with the information displayed in the top view, it is determined that the manufactured mask meets the requirements, and the design pattern in the mask is determined to be free of defects, so the manufactured mask can be put into the subsequent semiconductor process flow.

[0037] After analysis, it was found that in mask manufacturing, even if the information displayed in the above-...

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PUM

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Abstract

The invention discloses a mask comprising monitored patterns, and a monitoring method. The mask comprises designed patterns and the monitored patterns, wherein the monitored patterns comprise a first pattern, and a plurality of separated second patterns positioned on the two sides of the first pattern; the extension direction of the first pattern is parallel to the arrangement direction of the second patterns positioned on the same side of the first pattern; the first pattern and the second patterns positioned on one side of the first pattern have first key feature dimensions; the first pattern and the second patterns positioned on the other side of the first pattern have second key feature dimensions; and the first key feature dimensions and the second key feature dimensions are the same from top view. The mask in fault can be found effectively in time; the profile appearance and quality of the designed patterns of the mask can be judged; the pattern quality judging reliability of the mask can be improved; and the yield of a semiconductor product can be improved.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a mask plate containing monitoring patterns and a monitoring method. Background technique [0002] In the field of integrated circuit manufacturing, photolithography is used to transfer patterns from a photolithographic mask containing circuit design information to a wafer (wafer). The photolithographic mask, also known as photolithography A plate, a mask plate or a photomask is a flat plate with light transmission to the exposure light, and has at least one geometric figure with light shielding on the exposure light, which can selectively block the photoresist on the surface of the wafer The light on the wafer finally forms a corresponding pattern on the photoresist on the surface of the wafer. [0003] In semiconductor manufacturing, how to ensure that the geometric figures defining the design graphics are accurately formed on the mask plate is one of the k...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/44
CPCG03F1/44
Inventor 邢滨
Owner SEMICON MFG INT (SHANGHAI) CORP
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