Method and device for the laser-based working of two-dimensional, crystalline substrates, in particular semiconductor substrates
A laser processing and semiconductor technology, applied in laser welding equipment, metal processing equipment, semiconductor devices, etc., can solve problems such as separation
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[0060] figure 1 and figure 2 The basic steps of the processing method according to the invention are shown. A laser beam 2a emitted by a laser 3 (not shown) is irradiated onto an optical arrangement 6 (for the optical arrangement 6 only a plano-convex collimating mirror 11 is shown on figure 1 c (see also the description in the subsequent Figures 4 to 6 In the embodiment), the plano-convex collimating mirror 11 focuses the beam bundle of the laser beam 2a onto the substrate 1).
[0061] figure 1 a shows (in plan view on the substrate plane or in the x-y plane perpendicular to the direction of incident radiation z) the subsequently described elements 8, 7 and 13 utilizing an optical arrangement according to the invention without What happens in the case of inventing the necessary beam formation: From the irradiated laser beam 2a, only an expanded laser beam is produced on the beam output side over a defined expanded area along the beam direction (length direction 1 or ...
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