Device for manufacturing high-resolution alpha radiation source with magnetohydrodynamics electro-deposition method
A technology of magnetohydrodynamics and electrodeposition, which is applied in the direction of electrodes, electrolytic processes, electrolytic components, etc., can solve the problem of low energy resolution of radioactive sources, and achieve accelerated mass transfer rate, increased value transfer rate, and deposition efficiency high effect
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Embodiment 1
[0029] Such as figure 1 , figure 2 As shown, the high-precision two-dimensional positioning support 1 includes a base plate, a vertical fixing frame, and a vertical lifting arm. The electrodes and the electrode rotating motor are all arranged on the vertical lifting arm 6, and the vertical lifting arm 6 is controlled by the button on the external controller interface. Regulatory operation, and can realize its up and down movement by electrically adjusting the screw nut transmission device. The cleaned platinum anode wire is installed at the lower end of the electrode, and the platinum wire can be bent into different shapes. The permanent magnet control table 2 is installed on the bottom plate of the two-dimensional positioning bracket. Through the external controller of the high-precision two-dimensional positioning bracket, the lifting of the anode can be easily adjusted to adjust the distance between the anode and the cathode deposition source sheet. It can also be adjuste...
Embodiment 2
[0038] The device structure of this embodiment is basically the same as that of Embodiment 1. The difference from Embodiment 1 is that the vertical height of the anode is adjusted so that it is 7 mm away from the deposition source sheet; the rotation speed of the platinum electrode during the electrodeposition process is 50 r / min. Apply permanent magnets symmetrically on both sides of the deposition tank, the magnetic flux density of the two permanent magnets is 0.7T, and the distance between the center of the cathode deposition source sheet and the center of the axial surface of the permanent magnets on each side is 14mm. The device is left-right symmetrical, not only can apply magnetic field symmetrically on both sides of the deposition tank, but also can conveniently adjust the distance between the permanent magnet and the deposition tank, so as to realize the comprehensive study of the influence of different magnetic field sizes and different application methods on magnetohy...
Embodiment 3
[0040] The device structure of this embodiment is basically the same as that of Embodiment 1. The difference from Embodiment 1 is that the vertical height of the anode is adjusted so that it is 9 mm away from the deposition source sheet; the rotation speed of the platinum electrode during the electrodeposition process is 40 r / min. A permanent magnet is applied to one side of the deposition tank, the magnetic flux density of the permanent magnet is 0.7T, and the distance between the center of the cathode deposition source sheet and the center of the axial surface of the permanent magnet is 18mm.
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