Amorphous silicon flat-panel detector and preparation method thereof

Abstract

The invention provides an amorphous silicon flat-panel detector and a preparation method thereof. The method comprises the following steps: preparing an image sensor array on a substrate, and forming a planar focusing microlens material layer on the image sensor array; forming a photoresist layer on the focusing microlens material layer; carrying out exposure and development on the photoresist layer and forming a photoresist array, photoresist units in the photoresist array being in one-to-one correspondence with pixel units in the image sensor array; enabling each photoresist unit to be in a spherical crown shape through hot melting; enabling the spherical crown shape to be transferred to the focusing microlens material layer through etching, and forming a focusing microlens array; and forming a scintillation layer on the focusing microlens array. Through light condensation effect, more light beams are allowed to enter a light sensitive area of an image sensor, so that light collecting efficiency of the image sensor array is improved, and sensitivity of the amorphous silicon flat-panel detector is improved; and meanwhile, through convergence effect, optical crosstalk between adjacent pixels is reduced, and spatial resolution of the amorphous silicon flat-panel detector is improved.

Description

technical field [0001] The invention relates to the fields of medical radiation imaging, industrial flaw detection, security inspection and the like, in particular to an amorphous silicon flat panel detector and a preparation method thereof. Background technique [0002] X-ray digital photography technology has been more and more widely used in the field of medical imaging diagnosis today. Among various X-ray digital photography equipment, X-ray detector is the most core and key component with the highest technical content in this type of equipment. It plays an indispensable key role in the imaging acquisition process of the entire image. [0003] Such as figure 1 As shown, the amorphous silicon X-ray flat panel detector 1 mainly includes a scintillator 11 , an adhesive layer 12 , an image sensor array 13 and a substrate 14 . The imaging process of the amorphous silicon X-ray flat panel detector needs to go through the transformation process from "X-ray" to "visible light"...

AI Technical Summary

Problems solved by technology

The scintillator CSI is a columnar structure, and its scattering effect on the incident visible light is relatively smaller than that of the scintillator GOS, and its resolution is also higher than that of the scintillator GOS. However, the visible light scattering problem still limits the image resolution of the flat panel detector.

Images