Unlock instant, AI-driven research and patent intelligence for your innovation.

Mesa gallium arsenide-doped silicon blocking impurity band terahertz detector and manufacturing method thereof

A technology for terahertz detectors and impurity blocking is applied in the field of preparation of terahertz detection devices, which can solve the problems of weakening terahertz response current signals, and achieve the effects of reducing the recombination probability, enhancing the collection efficiency and shortening the transmission path.

Active Publication Date: 2019-09-17
NO 50 RES INST OF CHINA ELECTRONICS TECH GRP
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The advantage of this mode is that the preparation process is simple, and the disadvantage is that the photogenerated carriers need to pass through the gallium arsenide high-conductivity substrate before being collected by the negative electrode. However, the current development of gallium arsenide substrate technology lags behind the traditional silicon technology. Defect density in GaAs substrates (~10 3 cm -2 order of magnitude) than silicon substrates (~10 2 cm -2 order of magnitude) is much higher, and these defects, as recombination centers, can trap photogenerated carriers passing through the substrate, thereby weakening the terahertz response current signal

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mesa gallium arsenide-doped silicon blocking impurity band terahertz detector and manufacturing method thereof
  • Mesa gallium arsenide-doped silicon blocking impurity band terahertz detector and manufacturing method thereof
  • Mesa gallium arsenide-doped silicon blocking impurity band terahertz detector and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0052] This embodiment provides a mesa gallium arsenide-doped silicon barrier impurity band terahertz detector, such as figure 2 with image 3 As shown, it includes a high conductivity gallium arsenide substrate 1 arranged on a thermal deposition plate 10, the high conductivity gallium arsenide substrate 1 includes a ring area and a mesa structure area, and the mesa structure area is arranged in the middle of the ring area On the high-conductivity gallium arsenide substrate 1 of the annular region, the annular side formed by the connection between the annular region and the mesa structure region is provided with a silicon nitride passivation layer 5, and the high-conductivity gallium arsenide substrate of the mesa structure region 1. GaAs-doped silicon absorber layer 2, high-purity GaAs barrier layer 3, positive electrode contact layer 4 and silicon nitride passivation layer 5 are arranged sequentially from bottom to top; a ring-shaped negative electrode is arranged in the ri...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a countertop type gallium arsenide doped silicon impurity band blocking terahertz detector and a manufacture method thereof. The detector is used for detecting terahertz radiation. The detector comprises a high conductivity gallium arsenide substrate which comprises an annular region and a countertop structure region. The countertop structure region is arranged in the middle of the annular region. An annular negative electrode is arranged in the annular region. A circular positive electrode is arranged on the surface of the countertop structure region. The detector provided by the invention has the advantages that the annular negative electrode is prepared on the lower surface of a countertop, which reduces the probability that photogenerated carriers are captured by defects in the high conductivity gallium arsenide substrate; the collection efficiency of the photogenerated carriers is enhanced; the annular negative electrode structure is used, which shortens the transmission path of the photogenerated carriers; the recombination probability of the photogenerated carriers is reduced; and the collection efficiency of the photogenerated carriers is further enhanced.

Description

technical field [0001] The invention belongs to the technical field of preparation of terahertz detector devices, in particular to a mesa-type gallium arsenide-doped silicon-doped barrier impurity band terahertz detector and a manufacturing method thereof, which are suitable for making gallium arsenide-doped detectors with high collection efficiency and high responsivity Silicon blocking impurities with terahertz detectors. Background technique [0002] The blocked impurity band (BIB) detector is a low-temperature terahertz detector, which needs to work in a low-temperature environment below 4K. It has broad application prospects in anti-terrorism security inspection, medical imaging, biomedicine, non-destructive testing, material identification, astronomical observation, remote sensing early warning and other fields. Barrier impurity band detectors can be divided into silicon-based and gallium arsenide-based. Silicon-based barrier impurity band detectors can achieve high-s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/0224H01L31/08H01L31/18
CPCH01L31/022416H01L31/085H01L31/184Y02P70/50
Inventor 王兵兵王晓东陈雨璐尚竞成张传胜周德亮侯丽伟谢巍俞旭辉袁毅
Owner NO 50 RES INST OF CHINA ELECTRONICS TECH GRP