1 results about "Thermal deposition" patented technology

The application relates to a preparation method of a diffused island-shaped vanadium dioxide thermochromic film. The preparation method comprises the following steps: a precursor forming step: forming a vanadium oxide film with a thickness of 20-100 nm as a precursor on the surface of a substrate by a magnetron sputtering method, a thermal deposition method or a laser-induced vapor deposition method; a pretreatment step: heating the film to 600-950 DEG C at a temperature increasing rate of more than 80 DEG C / min in an annealing furnace with a pressure of 50 mTorr or less, then keeping the temperature for 5-30 min, and then cooling the film to 300-450 DEG C in the furnace to form the film into a diffused island shape; and an oxidation step: introducing oxygen into the annealing furnace to oxidize the film to obtain a vanadium dioxide film. The film prepared by the preparation method of the vanadium dioxide thermochromic film has good sunlight modulation efficiency and good light transmittance.