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A kind of nanometer multilayer structure wsx/dlc lubricating film and its preparation method

A nano-multilayer, DLC film technology, applied in nanotechnology, coating, metal material coating process, etc., can solve the problems of unknown tribological properties of thin films, complex preparation process, low wear resistance, etc., and achieve interface strengthening effect. Significant, excellent chemical inertness, extended service life effect

Active Publication Date: 2019-12-24
ZHEJIANG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Yang Fanger et al. ("Chinese Journal of Nonferrous Metals", 2016, 1:96-102) prepared WSx / a-C nano-multilayer film by magnetron sputtering method, but the hardness of the a-C film layer is low (5.1GPa), and the multilayer film The wear rate is about 10 -13 m 3 / Nm level, poor wear resistance
[0004] The above WS 2 In the preparation method of related films, WS 2 As the main film, its wear resistance is low, while WS 2 As an auxiliary film, although high hardness and wear resistance can be obtained, it has a high friction coefficient or the preparation process is complicated, and the tribological properties of the film in a vacuum environment are unknown

Method used

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  • A kind of nanometer multilayer structure wsx/dlc lubricating film and its preparation method
  • A kind of nanometer multilayer structure wsx/dlc lubricating film and its preparation method
  • A kind of nanometer multilayer structure wsx/dlc lubricating film and its preparation method

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] (1) Substrate pretreatment: put the polished single crystal silicon wafer in an ultrasonic cleaning instrument, and wash it with 10% hydrofluoric acid solution-acetone-absolute ethanol for 15 minutes to make the surface clean and clean. After drying with hot air, install it on the sample stage of the magnetron sputtering chamber.

[0036] (2) Experiment preparation: the graphite target, WS 2 After the target and the pretreated substrate are loaded into the multi-target magnetron sputtering deposition chamber, the air pressure in the deposition chamber is pumped to 1.2×10 -3 Pa, the distance between the target and the base is adjusted to 65mm, and a 50V DC negative bias is applied to the substrate, the substrate temperature control system is turned on to stabilize the substrate temperature at 200°C, and the working gas argon is introduced to keep the deposition pressure constant at 0.6Pa.

[0037] (3) Preparation of nano-multilayer film WSx / DLC: start the substrate posi...

Embodiment 2

[0039] (1) Substrate pretreatment: same as embodiment 1.

[0040] (2) Experiment preparation: the graphite target, WS 2 After the target and the pretreated substrate are loaded into the multi-target magnetron sputtering deposition chamber, the air pressure in the deposition chamber is pumped to 1.2×10 -3 Pa, the target base distance is adjusted to 70mm, add 50V DC negative bias to the substrate, turn on the substrate temperature control system to stabilize the substrate temperature at 150°C, pass in the working gas argon and keep the deposition pressure constant at 0.6Pa.

[0041] (3) Preparation of nano-multilayer film WSx / DLC: start the substrate position switching mechanism to keep the single crystal silicon wafer away from WS 2 target and graphite target, then turn on the sputtering power supply and ignite the WS 2 target (120W sputtering power) and graphite target (90W sputtering power). Quickly switch the monocrystalline silicon wafer to the WS 2 The position of the ...

Embodiment 3

[0043] (1) Substrate pretreatment: The low-carbon steel plate that has been ground and mechanically polished is subjected to conventional alkaline degreasing for 15 minutes, rinsed with clean water, soaked in a hydrochloric acid solution with a volume fraction of 1% for 5 minutes, rinsed with clean water, and placed in an ultrasonic cleaner Clean it with absolute ethanol for 15 minutes, dry it with hot air, and install it on the sample stage of the magnetron sputtering chamber.

[0044] (2) Experiment preparation: the graphite target, WS 2 After the target and the pretreated substrate are loaded into the multi-target magnetron sputtering deposition chamber, the air pressure in the deposition chamber is pumped to 1.2×10 -3 Pa, the target base distance is adjusted to 60mm, add 50V DC negative bias to the substrate, turn on the substrate temperature control system to stabilize the substrate temperature at 80°C, pass in the working gas argon and keep the deposition pressure consta...

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Abstract

The invention discloses a nanometer multi-layer structure WSx / DLC lubricating film and a manufacturing method. The manufacturing method mainly comprises the steps that 1, a base body is subjected to pretreatment, so that the surface of the base body is clean and smooth; 2, a WS2 target, a graphite target and the base body obtained after pretreatment are installed in a multi-target magnetron sputtering deposition system, air pressure of a deposition chamber is drawn to be below 1.5*(10-3)Pa, the target base distance and the base body direct current negative bias voltage are adjusted, high-purity argon is introduced, and stable air pressure is obtained; and 3, the base body is heated to a certain temperature, then the WS2 target and the graphite target serve as sputtering target materials, a WSx film and a DLC film are deposited on the surface of the base body in an alternating manner, parameters such as the modulation period of the multi-layer film, the thickness of the DLC film and the film thickness are controlled through deposition time, and therefore the WSx / DLC nanometer multi-layer film with the specific structure is obtained. The method is simple in technology and good in economy, the manufactured nanometer multi-layer film is high in hardness (t,9.5GPa), good in binding force (t,36N), and small in internal stress (1t,370MPa), the wear-resisting property is excellent in vacuum and humidity atmosphere environment (the friction coefficient in atmosphere and vacuum is lower than 0.17 and 0.1, and the wear rate is 1t,3*(10-15)m3 / Nm order), environmental sensitivity of the tribology property is reduced remarkably, and the film has a good application prospect.

Description

technical field [0001] The invention relates to a magnetron sputtering nano-multilayer film and a preparation method thereof, in particular to a WS 2 The invention relates to a preparation method of a solid lubricating film composed of diamond-like carbon (DLC), belonging to the field of material friction and wear and solid lubrication. Background technique [0002] Transition metal sulfides (MX 2 ) has excellent self-lubricating properties and has been widely used as a solid lubricant. Among them, WS 2 Because of its low friction coefficient, high working temperature and good wear resistance in vacuum environment, it is widely used in mechanical processing and aerospace and other fields. However, pure WS 2 The film structure is loose, its hardness and bearing capacity are limited, and it is easy to deliquesce and oxidize in a humid environment, and its wear resistance is poor. [0003] Currently, increasing WS 2 The methods of tribological performance of lubricating f...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/35B82Y40/00
CPCB82Y40/00C23C14/0605C23C14/0623C23C14/345C23C14/352
Inventor 郑晓华林玲玲杨芳儿鲁叶常新新王贡启王贵葱
Owner ZHEJIANG UNIV OF TECH