Display device, array substrate, thin film transistor, and manufacturing method thereof
A technology of thin film transistors and insulating layers, which is applied in the direction of transistors, semiconductor/solid-state device manufacturing, electric solid-state devices, etc., and can solve the problem of low deposition rate
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[0015] The present invention will be described in detail below with reference to the accompanying drawings and embodiments.
[0016] see figure 1 , figure 1 It is a schematic structural diagram of an embodiment of the thin film transistor of the present invention. The thin film transistor includes: a gate electrode layer 10 , a first insulating layer 11 , an active layer 12 , a passivation layer 13 , and source and drain electrode layers 14 . A first insulating layer 11 covers the gate electrode layer 10, an active layer 12 is formed on the first insulating layer 11, a passivation layer 13 covers the active layer 12, and source and drain electrode layers 14 are formed on the passivation layer 13 . The passivation layer 13 includes a second insulating layer 13a and a third insulating layer 13b, wherein the second insulating layer 13a is disposed close to the active layer 12 and is processed by an atomic layer deposition process, and the third insulating layer 13b covers the s...
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