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Array substrate, manufacturing method thereof and display panel

A technology for array substrates and display panels, which is applied in the manufacture of semiconductor/solid-state devices, electrical components, and electrical solid-state devices, etc., can solve the problems of high cathode resistance, affecting the display quality of light-emitting devices, and voltage drop.

Active Publication Date: 2017-11-07
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention provides an array substrate and its preparation method, and a display panel to solve the current problem of serious voltage drop due to high cathode resistance value, which further affects the display quality of light-emitting devices

Method used

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  • Array substrate, manufacturing method thereof and display panel
  • Array substrate, manufacturing method thereof and display panel
  • Array substrate, manufacturing method thereof and display panel

Examples

Experimental program
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Effect test

Embodiment 1

[0038] see figure 1 , which shows a structural block diagram of an array substrate according to Embodiment 1 of the present invention, specifically including:

[0039] A substrate 1 , an anode layer 2 , a first pixel defining layer 3 , an auxiliary cathode layer 4 , a second pixel defining layer 5 , an organic light emitting layer 6 and a cathode layer 7 .

[0040] In practical applications, the substrate 1 may be a BP substrate with a thin film transistor array fabricated, and may also include a planarization layer 8 formed on the BP substrate. The material of the planarization layer may be resin, polyimide, organic silicon, silicon dioxide and other materials, or silicon nitride material, which is not specifically limited in the present invention.

[0041] Then the anode layer 2 , the first pixel defining layer 3 and the auxiliary cathode layer 4 are sequentially patterned on the substrate 1 .

[0042] Wherein, the first pixel defining layer 3 divides a plurality of pixel ...

Embodiment 2

[0054] refer to figure 2 , which shows a flowchart of a method for preparing an array substrate according to Embodiment 2 of the present invention, specifically including:

[0055] Step 201: providing a substrate.

[0056] A flat layer 8 may be pre-formed on the substrate 1, such as image 3 shown.

[0057] The material of the planarization layer may be resin, polyimide, organic silicon, silicon dioxide and other materials, or silicon nitride material, which is not specifically limited in the present invention.

[0058] Before forming the planar layer, the following steps may also be included: forming a gate layer, a gate insulating layer, an active layer, an etching stopper layer, a passivation layer, and a resin layer on the substrate.

[0059] Specifically, a TFT pattern with a thickness of 1um-100um is formed by repeating film formation, exposure, etching, and development processes on the substrate many times. Common film formation processes include sputtering (Sputter...

Embodiment 3

[0079] The present invention also discloses a display panel, including the array substrate in the first embodiment.

[0080] It should be noted that the display panel in this embodiment can be any product or component with a display function such as a mobile phone, a tablet computer, a television, a notebook computer, a digital photo frame, and a navigator.

[0081] The display panel has all the advantages of the array panel in the first embodiment above, and will not be repeated here.

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Abstract

The invention provides an array substrate, a manufacturing method thereof and a display panel. The array substrate comprises a substrate, an anode layer, a first pixel definition layer, auxiliary cathode layers, a second pixel definition layer, an organic light emitting layer and a cathode layer, wherein the anode layer, the first pixel definition layer and the auxiliary cathode layers are patterned on the substrate; the first pixel definition layer divides multiple pixel units; the auxiliary cathode layers are arranged at two opposite sides of the pixel units; a lap joint area is arranged between the auxiliary cathode layers between the adjacent two pixel units; the second pixel definition layer is formed on the auxiliary cathode layers; the organic light emitting layer covers the first pixel definition layer, the second pixel definition layer and the anode layer; the cathode layer covers the organic light emitting layer; in the lap joint area, the organic light emitting layer is broken when close to the auxiliary cathode layer, the organic light emitting layer is broken with the auxiliary cathode layer, the cathode layer and the auxiliary cathode layer are in lap joint, and thus problems that as the cathode has high resistance, severe voltage drop is caused, and the display quality of a light-emitting device is further influenced can be solved.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a preparation method thereof, and a display panel. Background technique [0002] Compared with LCD (Liquid Crystal Display, Liquid Crystal Display), organic electroluminescent devices (Organic Light-Emitting Diode, OLED) have the advantages of self-luminescence, fast response, wide viewing angle, high brightness, bright colors, light and thin, etc., and are considered to be the next generation display technology. . [0003] Existing OLED devices are usually composed of an anode layer, a light-emitting layer and a cathode layer. According to the different light-emitting surfaces, they can be divided into two types: bottom emission and top emission. Because top emission devices can obtain a larger aperture ratio, they have become a research hotspot in recent years. Top-emitting OLEDs require thin cathodes and reflective anodes to increase light transmi...

Claims

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Application Information

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IPC IPC(8): H01L27/32H01L51/52H01L51/56
CPCH10K59/122H10K50/824H10K71/00
Inventor 高昕伟王辉锋王东方
Owner BOE TECH GRP CO LTD
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