Bidirectional transient voltage suppressor diode and manufacturing method thereof
A technology of transient voltage suppression and manufacturing method, which is applied in the fields of semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve the problems of complex manufacturing process, etc., and achieve the effect of simple manufacturing process and uniform concentration distribution.
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Embodiment 1
[0066] see figure 2 , the present invention provides a kind of manufacturing method of bidirectional transient voltage suppressing diode, the manufacturing method of described bidirectional transient voltage suppressing diode comprises the following steps at least:
[0067] 1) providing a substrate of a first doping type, the substrate of the first doping type comprising a first surface and a second surface;
[0068] 2) forming a first epitaxial layer of the first doping type on the first surface of the substrate of the first doping type;
[0069] 3) forming an epitaxial layer of a second doping type on the surface of the first epitaxial layer of the first doping type;
[0070] 4) forming a second epitaxial layer of the first doping type on the surface of the epitaxial layer of the second doping type;
[0071] 5) forming a first electrode on the surface of the second epitaxial layer of the first doping type;
[0072] 6) Forming a second electrode on the second surface of t...
Embodiment 2
[0104] read on Figure 14 , the present invention also provides a bidirectional transient voltage suppressor diode, the bidirectional transient voltage suppressor diode is manufactured by the manufacturing method described in Embodiment 1, and the bidirectional transient voltage suppressor diode includes: a first doped Type substrate 21, the substrate 21 of the first doping type includes a first surface 211 and a second surface 212; the first epitaxial layer 22 of the first doping type, the first epitaxial layer 22 of the first doping type The epitaxial layer 22 is located on the first surface 211 of the substrate 21 of the first doping type; the epitaxial layer 23 of the second doping type, and the epitaxial layer 23 of the second doping type is located on the first surface of the first doping type The surface of the first epitaxial layer 22; the second epitaxial layer 24 of the first doping type, the second epitaxial layer 24 of the first doping type is located on the surface ...
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