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Preparation method of nanometer metal grating and nanometer metal grating

A kind of nano metal, grating technology, applied in diffraction grating, opto-mechanical equipment, photoengraving process of pattern surface, etc.

Active Publication Date: 2018-12-11
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0012] The technical problem to be solved by the present invention is to provide a method for preparing a nano-metal grating and a nano-metal grating, which solve the problem that etching cannot be performed after the metal layer is oxidized

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  • Preparation method of nanometer metal grating and nanometer metal grating
  • Preparation method of nanometer metal grating and nanometer metal grating
  • Preparation method of nanometer metal grating and nanometer metal grating

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Embodiment Construction

[0028] The preparation method of the nano-metal grating and the specific implementation of the nano-metal grating provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0029] As mentioned in the background technology, after the residual imprinting glue is removed by oxygen ashing, if the process time is longer or the air flow control is inaccurate, oxygen will react with the exposed metal Al on the bottom layer to form a dense metal oxide film , and the metal oxide film is difficult to be etched, resulting in the impossibility of the subsequent etching process and the inability to form the nanometer metal grating. In view of this, the present invention provides a method for preparing a nano-metal grating, which increases the process time in the step of removing the residual imprinting glue, so that oxygen reacts with the exposed metal, and a dense oxide film is formed, and the oxide film is used to The film acts as a...

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Abstract

Disclosed is a method for preparing a nano metal grating (35). The method includes: forming a patterned metal oxide film (34) on a surface of a metal layer (31) by using the characteristic of forming a metal oxide during an oxygen ashing process, and making the nano metal grating (35) by using the patterned metal oxide film (34) as a mask film. First, the method solves the problem that the metal layer (31) cannot be etched after oxidation; and secondly, the metal oxide film (34) is used as a mask film for preparing the nano metal grating (35), and can also be used as a protective layer for the nano metal grating (35).

Description

technical field [0001] The invention relates to the liquid crystal display field, in particular to a method for preparing a nanometer metal grating and the nanometer metal grating. Background technique [0002] Nano-metal gratings can transmit incident light whose electric field direction is perpendicular to the direction of the grating, and reflect light whose electric field direction is parallel to the direction of the grating. Based on this working principle, the reflected light can be reused by adding an anti-reflection film, etc. , so the ability of the nano metal grating as a display polarizer to transmit incident light is far greater than that of the traditional polarizer, the transmittance can reach more than 90%, and the contrast ratio is also as high as 10000:1, which can greatly improve the transmittance of the LCD Ratio and contrast, to meet the needs of high penetration and high contrast in the market. [0003] Nano-imprinting technology is to use stamps with n...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G02B5/30G02F1/1335G03F7/00
CPCG02B5/1857G02B5/3058G02F1/133528G03F7/0002G02F1/133548
Inventor 侯俊卢马才
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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