Method for preparing micro-nano scale periodic or non-periodic structure at material surface

A periodic structure and non-periodic technology, applied in the manufacture of microstructure devices, microstructure technology, microstructure devices, etc., can solve problems such as lattice mismatch and thermal stress mismatch, and achieve low noise and operability Strong, long product life cycle effect

Inactive Publication Date: 2018-01-05
CHANGSHA ADVANCED MATERIALS IND RES INST CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But there are also problems of lattic

Method used

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  • Method for preparing micro-nano scale periodic or non-periodic structure at material surface
  • Method for preparing micro-nano scale periodic or non-periodic structure at material surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] High-purity single-crystal diamond was prepared by microwave plasma chemical vapor deposition equipment with a power of 75KW, and its size was processed into a high-purity diamond substrate of 20mm×20mm×10mm. A matrix-shaped periodic pattern with a resolution of 10nm was produced by etching technology and other steps. The surface of the obtained sample was smooth and straight, and the bottom of the etching groove was close to a square. This periodic diamond metamaterial can be used to prepare various reflection and transmission gratings, photonic crystal light-emitting diodes, Fresnel lenses, etc. under high radiation conditions, and can be used in medical treatment, outer space, nuclear power plants, etc. On the detection device used in the place.

Embodiment 2

[0033] High-purity single crystal diamond was prepared by microwave plasma chemical vapor deposition equipment with a power of 75KW, and its size was processed into a high-purity diamond substrate of 20mm×20mm×6mm. A 5nm matrix-shaped periodic pattern was produced by etching technology and other steps. The surface of the obtained sample was smooth, with good steepness, and the bottom of the etching groove was close to a square. This periodic diamond metamaterial can be used to prepare various reflection and transmission gratings, photonic crystal light-emitting diodes, Fresnel lenses, etc. under high radiation conditions, and can be used in medical treatment, outer space, nuclear power plants, etc. On the detection device used in the place.

Embodiment 3

[0035] High-purity single crystal diamond was prepared by microwave plasma chemical vapor deposition equipment with a power of 75KW, and its size was processed into a high-purity diamond substrate of 20mm×20mm×6mm. A 50nm inverted V-shaped periodic pattern was produced by etching technology. The surface of the obtained sample was smooth, with good steepness, and the bottom of the etching groove was close to square. This periodic diamond metamaterial can be used to prepare various reflection and transmission gratings, photonic crystal light-emitting diodes, Fresnel lenses, etc. under high radiation conditions, and can be used in medical treatment, outer space, nuclear power plants, etc. On the detection device used in the place.

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Abstract

The invention discloses a method for preparing a micro-nano scale periodic or non-periodic structure at the material surface, and especially relates to a method for preparing a periodic structure at the diamond surface. The method comprises the steps of (1) coating a substrate with imprinting glue, imprinting a template with a periodic or non-periodic structure to the substrate by using an imprinting technology and then demoulding to enable the imprinting glue to form bulges with periodicity at the surface of the substrate; (2) depositing a metal layer on the substrate after demoulding, and enabling the metal layer to be only deposited at the surfaces of the bulges; (3) performing plasma etching; and (4) stripping the deposited metal layer and the imprinting glue from the substrate to obtain a material with the surface having a periodic or non-periodic structure. The method is simple in preparation process and performs one-time molding; and the method is free of pollution, low in energy consumption, low in noise, free of sewage discharge and long in product life cycle. The method has universality and is universally applicable to preparation of various different micro/nano-scale periodic or non-periodic structure devices.

Description

technical field [0001] The invention relates to a method for preparing micro-nano-scale periodic or non-periodic structures on the surface of materials. Background technique [0002] Diamond is the hardest material in nature. As a true "gem", diamond offers a series of unique properties, including light transmission, thermal conductivity, rigidity, wear resistance and its electronic properties. Especially when the size and purity of diamond reach a certain level, many properties of diamond, especially optical and semiconductor properties, can be better exerted and widely used. [0003] Among the substrate materials, silicon and sapphire are commonly used substrate materials. Since the 1970s, with the continuous improvement of the preparation process of silicon materials and semiconductor surface technology, silicon detectors have been developed rapidly. However, in a strong radiation environment, the silicon lattice is susceptible to radiation damage, which increases the l...

Claims

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Application Information

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IPC IPC(8): H01L21/02H01L33/00B81C1/00G02B1/00
Inventor 黄翀
Owner CHANGSHA ADVANCED MATERIALS IND RES INST CO LTD
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