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Grating measurement device

A kind of grating measurement and grating technology, which is applied in the direction of measuring device, adopting optical device, converting sensor output, etc., can solve the problems of small vertical measurement range, inability to form effective interference, limited measurement range and spot size, etc., and achieve reduction The size of the transparent surface, the effect of improving energy utilization and compact size

Active Publication Date: 2018-02-06
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the structure of the corner cube prism, when there is vertical movement between the grating and the probe, the reference spot and the measurement spot at the receiver will deviate, and when the reference spot and the measurement spot deviate completely, effective interference cannot be formed
Therefore, the vertical measurement range is limited by the spot size, and the vertical measurement range between the grating and the probe is very small in this invention

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] Such as figure 1 As shown, the grating measuring device of the present embodiment includes:

[0054] The light source module 300 is used to generate two beams with different frequencies. For the sake of distinction, one of the two beams is called a measurement beam, and the other beam is called a reference beam;

[0055] Grating 200;

[0056] first detector;

[0057] second detector;

[0058] as well as

[0059] The grating measurement probe 100 includes a dual-frequency incident light module, a vertical detection module, a vertical measurement module and a reference detection module, wherein the dual-frequency light incident module is used to receive the measurement beam and the reference beam, and project the measurement beam To the vertical measurement module and the reference detection module, the reference beam is projected onto the vertical detection module and the reference detection module, the vertical measurement module projects the measurement beam onto t...

Embodiment 2

[0077] The difference between this embodiment and Embodiment 1 lies in that the route of the reference beam is different.

[0078] Such as figure 2 As shown, compared with Embodiment 1, the vertical detection module has fewer first and second reflectors 137 and 138 and a fourth beam splitter 134 . Specifically: after the reference beam is collimated by the second collimator 112, it is divided into two beams by the second beam splitter 132, and one of the reference beams is projected to the polarization of the vertical measurement module 120 by the third reflector 139. In the beam-splitting prism 121 , it merges with a measurement split beam, projects it onto the grating 200 , and returns the zero-order beam to the first remote coupler 135 . Another reference split beam merges with another measurement split beam through the third beam splitter 133 and is projected to the second remote coupler 136 . Other parts of the structure and working principles of this embodiment are th...

Embodiment 3

[0080] The difference between this embodiment and Embodiments 1 and 2 is that this embodiment can not only realize vertical measurement, but also can realize horizontal displacement measurement.

[0081] Such as image 3 As shown, the grating measurement device of this embodiment includes: a light source module 300, a grating measurement probe 100, a grating 200, and a plurality of detectors connected to the grating measurement probe 100. 100 inputs two light beams with different frequencies. After being detected by the grating 200, the grating measuring probe 100 outputs position information with X, Y, Z and a reference signal to the detector through a multimode optical fiber.

[0082] Such as image 3 As shown, compared with Embodiment 1, this embodiment adds a horizontal direction detection module and a horizontal direction measurement module, wherein the horizontal direction measurement module includes two symmetrically arranged first corner cubes, and the first corner cu...

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Abstract

The invention discloses a grating measurement device. The device includes a light source module used for generating two light beams having different frequencies, wherein one of the two light beams acts as a measurement light beam while the other acts as a reference light beam; a grating and a grating measurement probe including a double-frequency incidence module, a vertical measurement module, avertical detection module and a reference detection module. The double-frequency incidence module receives the measurement light beam and the reference light beam. The vertical measurement module casts the measurement light beam onto the grating, collects zero-level diffraction light of diffraction light subjected to secondary diffraction of the grating and casts the zero-level diffraction light to the vertical detection module. Interference of the zero-level diffraction light beam and the reference light beam occurs in the vertical detection module and vertical interference signals are formed. Interference of the measurement light beam and the reference light beam occurs in the reference detection module and reference interference signals are formed. A signal processing module calculatesvertical displacement of the grating after receiving the vertical interference signals and the reference interference signals. According to the invention, large-range vertical displacement measurementcan be realized in any working distance.

Description

technical field [0001] The invention relates to the field of integrated circuit manufacturing, in particular to a grating measuring device. Background technique [0002] Nano-measurement technology is the foundation of nano-processing, nano-manipulation, nano-materials and other fields. The IC industry, precision machinery, micro-electromechanical systems, etc. all require high-resolution, high-precision displacement sensors to achieve nanometer-precision positioning. With the rapid development of integrated circuits in the direction of large-scale and high integration, the requirements for overlay accuracy of lithography machines are getting higher and higher. Correspondingly, the accuracy of obtaining six-degree-of-freedom position information of workpiece tables and mask tables also increased. [0003] The interferometer has a high measurement accuracy, which can reach the nanometer level. In the lithography system, it is used to measure the position of the workpiece st...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/02
CPCG01B11/02G01D5/266G01B9/02001G01B9/02055G01B9/02007G01B2290/20G01B2290/30G01B2290/70
Inventor 吴萍张志平
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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