OLED device and fabrication method
A technology of device and wet film formation, which is applied in the manufacture of semiconductor/solid-state devices, electric solid-state devices, semiconductor devices, etc., can solve the problems of low luminous efficiency of devices, insufficient electron injection ability, high preparation cost, etc., and achieve device luminescence High efficiency, effective electron injection, good film quality
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[0031] The present application also provides a method for preparing an OLED device. It should be noted that the method for preparing an OLED device according to this embodiment can be used to prepare the above-mentioned OLED device. Please refer to the above-mentioned OLED device for detailed descriptions, and will not repeat them here. .
[0032] The method includes:
[0033] A. Provide the substrate;
[0034] B. Deposit a layer of anode material on the substrate by magnetron sputtering to form the anode;
[0035] C. Using a multi-source organic molecular vapor deposition system, the material of the hole injection layer, the material of the hole transport layer, the material of the light-emitting layer, and the material of the electron transport layer are sequentially deposited on the anode by vacuum evaporation to form in sequence Hole injection layer, hole transport layer, light emitting layer, electron transport layer;
[0036] D. In an inert gas environment, the multi-...
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