Sputtering target for forming magnetic thin film
A technology of sputtering targets and oxides, which is applied in the direction of sputtering coating, magnetic layer coating, sputtering coating coating, etc., to achieve the effects of suppressing the generation of powder particles, improving production efficiency, and reducing defective rates
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Embodiment 1
[0042] Prepare Co powder, Cr powder, Pt powder as metal powder, prepare Co 3 TiB 2 o 8 Powder, SiO 2 Powder, CoO powder as non-magnetic material powder. About Co 3 TiB 2 o 8 Powder, use pre-mixed CoO powder, TiO 2 Powder and B 2 o 3 Powder obtained by mixing, synthesizing, and pulverizing. Then, 2000 g of these powders were weighed in the following composition ratio.
[0043] Composition (atomic%): Co-1.17Cr-11.72Pt-3.13B-1.56Ti-3.13Si-20.31O
[0044] Next, the weighed powder was enclosed in a ball mill jar with a capacity of 10 liters together with grinding medium tungsten alloy balls, and it was rotated for 120 hours and mixed. The mixed powder thus obtained was filled into a carbon mold, and hot-pressed in a vacuum atmosphere at a temperature of 980° C., a holding time of 2 hours, and a pressing pressure of 30 MPa to obtain a sintered body. Then, this sintered body was cut with a lathe to obtain a disk-shaped sputtering target with a diameter of 164 mm and a thi...
Embodiment 2
[0049] Prepare Co powder, Pt powder as metal powder, prepare CrBO 3 Powder, TiBO 3 Powder, TiO 2 Powder, Co 3 o 4 Powder as non-magnetic material powder. About CrBO 3 powder, using pre-mixed Cr 2 o 3 powder, B 2 o 3 Powder obtained by powder mixing, synthesis, and pulverization, about TiBO 3 powder, use Ti 2 o 3 Powder and B 2 o 3 Powder obtained by mixing, synthesizing, and pulverizing. Then, 2000 g of these powders were weighed in the following composition ratio. Then, the weighed powders were mixed by the same method as in Example 1, followed by hot pressing, and the thus obtained sintered body was cut to obtain a sputtering target.
[0050] Composition (atomic%): Co-1.19Cr-11.90Pt-3.17B-2.38Ti-15.87O
[0051] Next, quantitative analysis of boron was carried out on the collected pulverized powder of this sputtering target by the same method as in Example 1. As a result, boron oxide (B 2 o 3 ) in the leaching amount of metal boron in water is 40 μg. The sp...
Embodiment 3
[0053] Prepare Co powder, Cr powder, Pt powder as metal powder, prepare CrBO 3 Powder, Mn 3 B 2 o 6 powder, CoO powder, SiO 2 Powder as non-magnetic material powder. About Mn 3 B 2 o 6 powder, using pre-mixed MnO powder, B 2 o 3 Powder obtained by mixing, synthesizing, and pulverizing. Then, 2000 g of these powders were weighed in the following composition ratio. Then, the weighed powders were mixed by the same method as in Example 1, followed by hot pressing, and the thus obtained sintered body was cut to obtain a sputtering target.
[0054]Composition (atomic%): Co-3.2Cr-12.4Pt-3.20B-2.40Mn-1.60Si-18.40O
[0055] Next, quantitative analysis of boron was carried out on the collected pulverized powder of this sputtering target by the same method as in Example 1. As a result, boron oxide (B 2 o 3 ) The leaching amount of metal boron in water is 180 μg. The specific surface area of the pulverized powder is 0.15m 2 / g, therefore, the boron oxide (B 2 o 3 ) leac...
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