Novel mask film and evaporation device

A mask and a new type of technology, applied in the field of new masks and evaporation devices, can solve the problems of mask substrate damage, mask pollution, difficult processing, etc., to reduce the possibility of damage, optimize contact methods, and prevent pollution. Effect
CN108149191AInactive Publication Date: 2018-06-12GUAN YEOLIGHT TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
GUAN YEOLIGHT TECH CO LTD
Publication Date
2018-06-12
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a novel mask film which comprises a mask film main body and a mask film frame integrally designed with the mask film main body and surrounding the mask film main body. A designated pattern is formed on the mask film main body, mounting holes are distributed in the mask film frame, and supporting structures are arranged in the mounting holes. Compared with the prior art, according to the technical scheme, the mask film main body is not modified, and the influence on the evaporated pattern can be avoided accordingly; and on the basis of further improvement on the technical scheme, the heights of the supporting structures can be adjusted, the situation that fragmenting or cracking occurs to a substrate due to the problem of the lateral flatness of the mask film or thesubstrate is avoided, and pollution on the mask film can be reduced to the largest extent as well.
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Description

technical field

[0001] The present disclosure generally relates to the technical field of evaporation technology, and in particular relates to a novel mask and an evaporation device. Background technique

[0002] Evaporation is the process of evaporating or sublimating the material to be filmed in a vacuum to precipitate on the surface of the workpiece or the substrate. Heating the material and plating it on the substrate is called vacuum evaporation, or vacuum coating. The vacuum coating process is widely used in the manufacturing process of products, such as: hole injection layer, air transport layer, light emitting layer, electron transport layer, etc. of organic light-emitting diode (OLED) display devices.

[0003] In the current evaporation process, the film-forming range is defined by a mask, and the structure of the substrate and the mask is: the mask is in contact with the substrate, and the substrate is followed by a back plate and a magnetic plate, and the magnetic...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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