One-time well completion method through VCR method
A one-off, high-well technology, applied in blasting and other directions, can solve problems such as the inability to form the center of the pilot tunnel, the inability to complete the blasting of the wellbore, and the blockage of the middle and upper blasting, and achieve high explosive utilization, good well-forming effect, and high-efficiency well-forming
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Embodiment 1
[0027] This embodiment discloses a one-time well forming method of the VCR method, comprising the following steps:
[0028] a. Drill a center hole 1 at the center of the raised well face of the proposed well, and then drill a compensation hole 2 around the center hole 1 and a peripheral hole 3 around the center hole 1 in sequence. The compensation hole 2 and the peripheral hole 3 are both in line with the center Hole 1 is vertically parallel (eg figure 1 shown).
[0029] In this step, preferably, the diameters of the central hole 1 and the peripheral hole 3 are both 80 mm, and the diameter of the compensation hole 2 is 120 mm. The distance between the peripheral hole 3 and the central hole 1 is 800mm, the distance between any two adjacent peripheral holes 3 is 1500mm, and the distance between the compensation hole 2 and the central hole 1 is 300mm.
[0030] In this step, the central hole 1, the compensation hole 2 and the peripheral hole 3 are all drilled and formed at one t...
Embodiment 2
[0040] This embodiment discloses a one-time well forming method of the VCR method, comprising the following steps:
[0041] a. Drill a center hole 1 at the center of the raised well face of the proposed well, and then drill a compensation hole 2 around the center hole 1 and a peripheral hole 3 around the center hole 1 in sequence. The compensation hole 2 and the peripheral hole 3 are both in line with the center Hole 1 is vertically parallel (eg figure 1 shown).
[0042]In this step, preferably, the diameters of the central hole 1 and the peripheral hole 3 are both 100 mm, and the diameter of the compensation hole 2 is 150 mm. The distance between the peripheral hole 3 and the central hole 1 is 1200mm, the distance between any two adjacent peripheral holes 3 is 1800mm, and the distance between the compensation hole 2 and the central hole 1 is 3500mm.
[0043] b. The central hole 1 and the peripheral hole 3 are charged with explosives in sections, and two adjacent sections of...
Embodiment 3
[0046] This embodiment discloses a one-time well forming method of the VCR method, comprising the following steps:
[0047] a. Drill a center hole 1 at the center of the raised well face of the proposed well, and then drill a compensation hole 2 around the center hole 1 and a peripheral hole 3 around the center hole 1 in sequence. The compensation hole 2 and the peripheral hole 3 are both in line with the center Hole 1 is vertically parallel (eg figure 1 shown).
[0048] In this step, preferably, the diameters of the central hole 1 and the peripheral hole 3 are both 90 mm, and the diameter of the compensation hole 2 is 130 mm. The distance between the peripheral hole 3 and the central hole 1 is 1000mm, the distance between any two adjacent peripheral holes 3 is 1650mm, and the distance between the compensation hole 2 and the central hole 1 is 400mm.
[0049] b. The central hole 1 and the peripheral hole 3 are charged with explosives in sections, and two adjacent sections of ...
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