PVD coating technology
A coating process and workpiece surface technology, applied in the direction of metal material coating process, coating, ion implantation plating, etc., can solve the problems of increasing complexity and increasing production cost, so as to reduce complicated procedures and improve production efficiency. , a wide range of effects
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Embodiment 1
[0021] A PVD coating process is characterized in that: comprising the following process steps:
[0022] Step 1: Vacuum-coat UV primer on the surface of the workpiece, the film thickness is 0.8 microns, and then the baking process is required, the baking temperature is 70 ° C, and the baking time is 2 minutes;
[0023] Step 2: After coating the UV primer, use PVD magnetron ion sputtering to coat white. PVD magnetron ion sputtering needs to be completed in magnetron sputtering equipment. The equipment needs to be cleaned before working. The equipment parameters are as follows, the vacuum degree is 3×10 -4 Torr, the target current is 4A, the cleaning time is 100s, a single metal target is used, the metal target is a titanium target, the parameters of the equipment are as follows, the vacuum degree is 0.2×10 -5 Torr, the bias value is 60V, the current of the target is 3A, PVD magnetron ion sputtering plating, so that a layer of coating is deposited on the surface of the workpiece...
Embodiment 2
[0030] A PVD coating process is characterized in that: comprising the following process steps:
[0031] Step 1: Vacuum-coat UV primer on the surface of the workpiece, the film thickness is 1.3 microns, and then a baking process is required, the baking temperature is 78 ° C, and the baking time is 2.6 minutes;
[0032] Step 2: After coating the UV primer, use PVD magnetron ion sputtering to coat white. PVD magnetron ion sputtering needs to be completed in magnetron sputtering equipment. The equipment needs to be cleaned before working. The equipment parameters are as follows, the vacuum degree is 3.5×10 -4 Torr, the target current is 4.6A, the cleaning time is 150s, a single metal target is used, the metal target is a tin target, the parameters of the equipment are as follows, the vacuum degree is 0.4×10 -5 Torr, the bias voltage value is 86V, the current of the target is 5A, PVD magnetron ion sputtering plating, so that a layer of coating film is deposited on the surface of t...
Embodiment 3
[0039] A PVD coating process is characterized in that: comprising the following process steps:
[0040] Step 1: Vacuum-coat UV primer on the surface of the workpiece, the film thickness is 1.7 microns, and then a baking process is required, the baking temperature is 86 ° C, and the baking time is 3 minutes;
[0041] Step 2: After coating the UV primer, use PVD magnetron ion sputtering to coat white. PVD magnetron ion sputtering needs to be completed in magnetron sputtering equipment. The equipment needs to be cleaned before working. The equipment parameters are as follows, the vacuum degree is 4×10 -4 Torr, the target current is 5A, the cleaning time is 200s, a single metal target is used, the metal target is an aluminum target, the parameters of the equipment are as follows, the vacuum degree is 0.7×10 -5Torr, the bias value is 110V, the current of the target is 7A, PVD magnetron ion sputtering plating, so that a layer of coating film is deposited on the surface of the workp...
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