Plasma exhaust gas comprehensive processing device

A waste gas treatment device and comprehensive treatment technology, applied in the direction of gas treatment, solid separation, separation methods, etc., can solve problems such as unsuitable operation, failure to achieve automatic cleaning, complex structure and composition, and achieve simple and convenient operation, saving manpower and material resources, and facilities The effect of reduced investment

Active Publication Date: 2018-07-17
ANHUI UNIV OF SCI & TECH
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  • Application Information

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Problems solved by technology

A variety of plasma waste gas technologies are disclosed in Chinese patents, such as the patent application number: 200980135309.9 discloses a "plasma treatment method and equipment", the structure of the plasma technology disclosed in this patent application is quite complicated, and it is not suitable operation, can not achieve the role of automatic cleaning

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  • Plasma exhaust gas comprehensive processing device
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Embodiment Construction

[0032] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them.

[0033] Examples of the described embodiments are shown in the drawings, wherein like or similar reference numerals designate like or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0034] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "...

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Abstract

The invention discloses a plasma exhaust gas comprehensive processing device, which comprises an insulating casing, a base, and a tungsten wire. The base is fixedly connected with the insulating casing, the base is provided with a water outlet, the top end of the insulating casing is provided with a gas inlet, a filter device is fixed in the middle portion of the inner cavity of the insulating casing, the filter device comprises electrodes, separators, ground electrodes and a low-voltage power source, the electrodes and the ground electrodes are electrically connected with the low-voltage power source through wires, gaps are arranged between the electrodes and the ground electrodes, and the electrodes and the ground electrodes are spaced apart. The top ends and the bottom ends of the electrodes and the ground electrodes are fixedly provided with the separators, and the separators are fixed on the inner wall of the insulating casing. The exhaust gas comprehensive processing device withautomatic electrode cleaning design has the advantages of simple structure, convenient operation and automatic cleaning.

Description

technical field [0001] The invention relates to the technical field of exhaust gas treatment, in particular to an automatic cleaning device for gas discharge plasma exhaust gas treatment. Background technique [0002] With the deepening of the level of social industrialization, various types of pollution including solids, water and air will inevitably be produced. Among them, the generation of waste gas pollution is mainly produced with the development of heavy industry, because the waste gas usually contains a large amount of volatile organic compounds such as VOCs, benzene series, fluoride, halocarbon compounds, sulfur dioxide, nitrogen oxides, dioxins, etc. Toxic and harmful gases, particulate matter, etc., it is particularly important to alleviate the pressure on environmental protection to find a method with high feasibility and no secondary pollution to deal with the above-mentioned organic pollutants. [0003] Traditionally, the combustion method is the most effectiv...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/32B03C3/017
CPCB01D53/323B01D2257/302B01D2257/404B01D2257/70B01D2257/7027B01D2257/708B01D2259/818B03C3/017
Inventor 李平徐俊生方静谢涛旭陈兆权宋晓顾军
Owner ANHUI UNIV OF SCI & TECH
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