The invention discloses a plasma exhaust gas comprehensive processing device, which comprises an insulating casing, a base, and a tungsten wire. The base is fixedly connected with the insulating casing, the base is provided with a water outlet, the top end of the insulating casing is provided with a gas inlet, a filter device is fixed in the middle portion of the inner cavity of the insulating casing, the filter device comprises electrodes, separators, ground electrodes and a low-voltage power source, the electrodes and the ground electrodes are electrically connected with the low-voltage power source through wires, gaps are arranged between the electrodes and the ground electrodes, and the electrodes and the ground electrodes are spaced apart. The top ends and the bottom ends of the electrodes and the ground electrodes are fixedly provided with the separators, and the separators are fixed on the inner wall of the insulating casing. The exhaust gas comprehensive processing device withautomatic electrode cleaning design has the advantages of simple structure, convenient operation and automatic cleaning.