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Photocurable composition and photocurable film formed from the photocurable composition

A photocurable, compound technology, applied in the field of photocurable films and photocurable compositions, can solve the problems of rising composition viscosity, fine patterning limitations, etc., to improve crosslinking density and hardness, polymerization or curing reactivity The effect of excellent, excellent moisture barrier properties

Active Publication Date: 2020-09-01
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, when an alkali-soluble resin is included, the viscosity of the composition increases and there is a limit in achieving the desired fine patterning

Method used

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  • Photocurable composition and photocurable film formed from the photocurable composition
  • Photocurable composition and photocurable film formed from the photocurable composition
  • Photocurable composition and photocurable film formed from the photocurable composition

Examples

Experimental program
Comparison scheme
Effect test

experiment example

[0238] The viscosity, coatability, pencil hardness, and oxygen inhibition of the composition of Table 1 or the coating film and photocurable film formed from these compositions were evaluated by the evaluation method described later. The evaluation results are shown in Table 2 below.

[0239] (1) Viscosity measurement

[0240] Using a viscometer (DV3T, manufactured by Brookfield Co., Ltd.) (measurement conditions: rotation speed: 20 rpm / 25° C.), the viscosity of each composition of the examples and comparative examples was measured.

[0241] (2) Evaluation of coatability

[0242] The compositions of the Examples and Comparative Examples were spin-coated on a silicon (Si) sheet cut into 50 mm X 50 mm to form a coating film so as to have a thickness of 3.0 μm. After spin coating, it was left for 5 minutes, the shape of the coating film was observed, and the coating properties were evaluated as follows.

[0243]

[0244] ○: The coating film is evenly spread and the surface is uniform (...

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PUM

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Abstract

The present invention provides a photocurable composition containing a bifunctional or higher allyl ether compound and a monofunctional to trifunctional (meth)acrylate, and a photocurable film formed from the photocurable composition. compound, bismaleimide compound, monomer containing carboxylic acid, and photoinitiator. Through the interaction of the allyl ether compound, the bismaleimide compound, and the (meth)acrylate compound, a composition and a photocurable film having low viscosity, improved reactivity, and coatability can be realized.

Description

Technical field [0001] The present invention relates to a photocurable composition and a photocurable film formed from the photocurable composition. More specifically, it relates to a photocurable composition containing a photopolymerizable monomer and a photocurable film formed from the photocurable composition. Background technique [0002] In order to form various photocurable insulating patterns such as photoresists, insulating films, protective films, black matrices, and columnar spacers of display devices, photosensitive compositions are used. After the above-mentioned photosensitive composition is applied, it is possible to form a photocurable pattern of a predetermined shape in a desired area through an exposure step and / or a development step. The above-mentioned photosensitive composition needs to have, for example, high sensitivity to ultraviolet exposure and polymerization reactivity, and the pattern formed from the photosensitive composition needs to have improved he...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F222/14C08F216/00C08F222/40C08F222/20
CPCC08F222/10C08F222/102C08F216/00C08F222/404C08F222/402G03F7/027G03F7/031G03F7/004
Inventor 赵庸桓金圣彬崔和燮
Owner DONGWOO FINE CHEM CO LTD