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PHOTOCURABLE COMPOSITION AND PHOTOCURABLE film FORMED FROM THE SAME

A photocurable, compound technology, applied in the field of photocurable films and photocurable compositions, can solve the problems of rising composition viscosity, fine patterning limitations, etc., to improve crosslinking density and hardness, excellent gas and moisture barrier characteristics, the effect of improving flexibility

Active Publication Date: 2018-07-27
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, when an alkali-soluble resin is included, the viscosity of the composition increases and there is a limit in achieving the desired fine patterning

Method used

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  • PHOTOCURABLE COMPOSITION AND PHOTOCURABLE film FORMED FROM THE SAME
  • PHOTOCURABLE COMPOSITION AND PHOTOCURABLE film FORMED FROM THE SAME
  • PHOTOCURABLE COMPOSITION AND PHOTOCURABLE film FORMED FROM THE SAME

Examples

Experimental program
Comparison scheme
Effect test

experiment example

[0262] The compositions in Tables 1 and 2, or coating films formed from these compositions, and photocured films were evaluated for coatability, Martens hardness, indentation modulus, and oxygen inhibition by the evaluation methods described later. The evaluation results are shown in Table 3 below.

[0263] (1) Coatability evaluation

[0264] Each composition of the Examples and Comparative Examples was spin-coated on a silicon (Si) sheet cut into a size of 50 mm×50 mm to form a coating film so as to have a thickness of 3.0 μm. After spin coating, it was left to stand for 5 minutes, the shape of the coating film was observed, and applicability was evaluated as follows.

[0265]

[0266] ○: The coating film is spread evenly and has a uniform surface (see Figure 4 )

[0267] △: Although the composition was developed, surface unevenness was observed with the naked eye (see Figure 5 )

[0268] ×: The surface is not wetted but the liquid dries and the coating film is not...

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Abstract

The invention provides a photocurable composition and a photocurable film formed from the same. The photocurable composition contains an allyl ether compound comprising two or more functional groups,a (meth)acrylate compound comprising one to three functional groups, a siloxane (meth)acrylate compound, a carboxylic acid-containing monomer and a photoinitiator. Through interaction between the allyl ether compound and the (meth)acrylate compounds, a composition and a photocurable film with low viscosity and improved reactivity, hardness and flexibility can be realized.

Description

technical field [0001] The present invention relates to a photocurable composition and a photocurable film formed from the photocurable composition. More specifically, it relates to a photocurable composition containing a photopolymerizable monomer, and a photocurable film formed from the photocurable composition. Background technique [0002] In order to form various photocurable insulating patterns such as photoresists, insulating films, protective films, black matrices, and columnar spacers of display devices, photosensitive compositions are used. After applying the above-mentioned photosensitive composition, a photocured pattern of a predetermined shape can be formed in a desired region through an exposure step and / or a development step. The above-mentioned photosensitive composition needs to have, for example, high sensitivity to ultraviolet light exposure and polymerization reactivity, and the pattern formed from the photosensitive composition needs to have improved h...

Claims

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Application Information

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IPC IPC(8): C08F230/08C08F216/00C08F222/14C08F220/18C08F222/16G03F7/075
CPCG03F7/0758C08F230/08C08F216/00C08F220/1811C08F222/16C08F222/102G03F7/0755G03F7/027G03F7/028G03F7/004
Inventor 赵庸桓金圣彬朴汉雨
Owner DONGWOO FINE CHEM CO LTD
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