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Half-metal preparation process of MnAs/GaAs-based interface

A preparation process and semi-metal technology, applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve problems such as backward methods and achieve good market application value

Inactive Publication Date: 2018-07-27
XUCHANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Therefore, the existing process method is backward and needs to be improved

Method used

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  • Half-metal preparation process of MnAs/GaAs-based interface
  • Half-metal preparation process of MnAs/GaAs-based interface
  • Half-metal preparation process of MnAs/GaAs-based interface

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Embodiment Construction

[0019] In order to facilitate the understanding of the present invention, the present invention will be described in more detail below in conjunction with the accompanying drawings and specific embodiments. Preferred embodiments of the invention are shown in the accompanying drawings. However, the present invention can be implemented in many different forms and is not limited to the embodiments described in this specification. On the contrary, these embodiments are provided to make the understanding of the disclosure of the present invention more thorough and comprehensive.

[0020] It should be noted that when an element is referred to as being “fixed” to another element, it can be directly on the other element or there can also be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present.

[0021] Unless otherwise defined, all technical and sc...

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Abstract

The invention discloses a half-metal preparation process of a MnAs / GaAs-based interface. The half-metal preparation process comprises the following steps of 1, building sphalerite MnAs crystal structure, and optimizing a lattice structure; 2, calculating and analyzing state density of MnAs under a balance lattice constant aeq; 3, building and optimizing four interface structures in MnAs / GaAs (001)direction; 4, calculating and analyzing the state density of the optimized interface structure; and 5, obtaining the interface structure having half-metal characteristic by analysis and comparison. With the adoption of the scheme, various advantages of a spinning electron device can be developed to the best, and the half-metal preparation process has good market application value.

Description

technical field [0001] The invention relates to a preparation process based on the half-metallicity of the MnAs / GaAs interface. Background technique [0002] It is well known that obtaining high spin-polarized current is a key factor for the application of spintronic devices such as spin valves and spin filters. With 100% spin polarization, half-metallic materials can be regarded as ideal injection sources for spin injection from ferromagnets to semiconductors. Therefore, finding and synthesizing semi-metallic materials has become a concern of many theoretical and experimental workers. So far, many kinds of compounds have been found to be half-metallic ferromagnets, such as: rutile CrO 2 , transition metal carbon-sulfur compounds of sphalerite, semi- or full-Heusler alloys, and carbon-nitrogen-alkaline earth metal compounds of rock-salt structure. Among these half-metallic ferromagnets, sphalerite carbonitrides are considered to be very good spin-injection materials due t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/66
CPCH01L29/66984
Inventor 韩红培
Owner XUCHANG UNIV
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