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Cr-Fe-V-Ta-W-series high-entropy alloy thin film for high throughput screening and preparation method thereof

A cr-fe-v-ta-w, high-entropy alloy technology, applied in high-throughput screening Cr-Fe-V-Ta-W high-entropy alloy film and its preparation field, can solve the problem of high cost and high efficiency Low and hinder the development and industrial application of low-activation high-entropy alloys, and achieve the effect of high flux and simple preparation method

Active Publication Date: 2018-08-03
UNIV OF SCI & TECH BEIJING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The high cost and low efficiency of the existing technology has greatly hindered the development and industrial application of low-activation high-entropy alloys, a new type of material.

Method used

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  • Cr-Fe-V-Ta-W-series high-entropy alloy thin film for high throughput screening and preparation method thereof
  • Cr-Fe-V-Ta-W-series high-entropy alloy thin film for high throughput screening and preparation method thereof
  • Cr-Fe-V-Ta-W-series high-entropy alloy thin film for high throughput screening and preparation method thereof

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preparation example Construction

[0035] The present invention also provides a method for preparing a Cr-Fe-V-Ta-W high-entropy alloy film for high-throughput screening described in the above technical solution, comprising the following steps:

[0036] (1) Provide targets according to the components described in the above technical scheme;

[0037] (2) Install the target material obtained in the step (1) on the target position of the multi-target magnetron sputtering equipment, fix the substrate on the sample stage of the multi-target magnetron sputtering equipment, and then perform co-sputtering.

[0038] The present invention provides a target according to the components described in the above technical solution. In the present invention, there is no special limitation on the size of the target material, which can be adjusted according to the required film size.

[0039] In a technical solution of the present invention, the target is preferably a CrFeV alloy target and a TaW alloy target. In the present in...

Embodiment 1

[0058] 1. Use arc melting and other methods to prepare CrFeV alloy targets and TaW alloy targets with a diameter of 50 mm and a thickness of 4 mm.

[0059] 2. Install the two alloy targets in the multi-target magnetron sputtering equipment, the positions of the two targets form an angle of 120 degrees with each other, and the distance between the centers of the two targets is 10cm.

[0060] 3. Place a 140×10×1mm single crystal silicon substrate at the center of the two targets, with the long side parallel to the centerlines of the two, and then fix the sample stage to keep the relative distance between the substrate and the target unchanged. The specific location relationship is as figure 1 shown.

[0061] 4. The TaW target is connected to a DC power supply, the sputtering power is set to 80W, the CrFeV target is connected to a DC power supply, the sputtering power is set to 100W, and the sputtering time is 1 hour. Finally, Cr-FeV-Ta- W high-entropy alloy thin films.

[006...

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Abstract

The invention provides a Cr-Fe-V-Ta-W-series high-entropy alloy thin film for high throughput screening and a preparation method thereof and belongs to the field of high-entropy alloys. The componentexpression of the Cr-Fe-V-Ta-W-series high-entropy alloy thin film for high throughput screening is (CrFeV<c>)<100-x>(Ta<d>W<e>)<x>, wherein x is larger than 6 and smaller than 100; values of a,b and c meet the situation that the difference of substance amounts of any two of Cr, Fe and V does not exceed 2% of the total substance amount of all elements, and values of d and e meet the situation that the difference of substance amounts of Ta and W does not exceed 3% of the total substance amount of all the elements; and the transverse components of the Cr-Fe-V-Ta-W-series high-entropy alloy thin film for high throughput screening are the same, and the atom percentage compositions of longitudinal Cr, Fe and V are distributed in a gradient mode. The method is simple, the throughput is high, and the Cr-Fe-V-Ta-W-series high-entropy alloy thin film for high throughput screening and with components distributed in a gradient mode can be obtained through one-time co-sputtering.

Description

technical field [0001] The invention relates to the technical field of metal materials, in particular to a Cr-Fe-V-Ta-W high-entropy alloy film for high-throughput screening and a preparation method thereof. Background technique [0002] High-entropy alloys are generally defined as alloys formed by alloying five or more elemental elements according to an equiatomic ratio or close to an equiatomic ratio. Potentially significantly superior to conventional metallic materials. Among them, high-entropy alloy thin films have broad application prospects in the fields of corrosion-resistant coatings, photothermal conversion coatings, and radiation-resistant materials, and have received a lot of research and attention. In 1983, Bloom et al. proposed the concept of low-activation materials, and proposed that elements with low long-term radioactivity, such as vanadium, tantalum, and tungsten, should be added to the composition design of materials. High-entropy alloy thin film materia...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/14C22C30/00C22C45/00
CPCC22C30/00C22C45/00C23C14/14C23C14/352
Inventor 张勇邢秋玮张蔚冉
Owner UNIV OF SCI & TECH BEIJING